Optical Emission Spectroscopy Analysis of Ar/N 2 Plasma in Reactive Magnetron Sputtering

• Published in: Plasma processes and polymers Vol. 6; no. S1
• Main Authors: Bousquet, Angélique, Spinelle, Laurent, Cellier, Joël, Tomasella, Eric
• Format: Journal Article
• Language: English
• Published: 01.06.2009

Abstract The ternary silicon carbide‐nitride SiC x N y presents very promising properties: hardness, low chemical reactivity, and resistance to oxidation. This material can be deposited by various processes, but reactive magnetron sputtering is one of the most versatile. In this paper, we investigat...