Formation and investigation of characteristics of thermoresistive structures based on vanadium oxide films

• Published in: Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki Vol. 19; no. 4; pp. 85 - 93
• Main Authors: Nguyen, T. D., Zanko, A. I., Golosov, D. A., Zavadski, S. M., Melnikov, S. N., Kolos, V. V., Тоlochko, N. К.
• Format: Journal Article
• Language: English; Russian
• Published: Educational institution «Belarusian State University of Informatics and Radioelectronics 01.07.2021
• Subjects: annealing; contact resistance; microbolometer; reactive magnetron sputtering; thermoresistive structure; vanadium oxide

The processes of reactive magnetron sputtering of a V target in Ar/O 2 gas mixture are investigated. It was found that when using a pulsed current for sputtering and a pressure in the chamber less than 0.06 Pa, the intensities of the emission lines of vanadium at 437.922 nm, argon at 750.386 nm, and...