Advanced Carriers on Legacy CMP Tools - an Intelligent Solution for Flexible Production Environments and R&D Labs

This paper describes the potential of a membrane carrier upgrade for legacy CMP tools, such as an IPEC 472. Seventeen different polish parameter settings were applied for both, 150 mm and 200 mm wafers in order to cover a wide range of applications. Resulting from these experiments, a significant pe...

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Published inECS transactions Vol. 72; no. 18; pp. 17 - 24
Main Authors Franz, Mathias, Schubert, Ina, Junghans, Romy, Martinka, Ronny, Rudolph, Catharina, Wachsmuth, Holger, Trojan, Dan, VanDevender, Barrie, Wrschka, Peter, Gottfried, Knut Christoph
Format Journal Article
LanguageEnglish
Published The Electrochemical Society, Inc 28.07.2016
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Abstract This paper describes the potential of a membrane carrier upgrade for legacy CMP tools, such as an IPEC 472. Seventeen different polish parameter settings were applied for both, 150 mm and 200 mm wafers in order to cover a wide range of applications. Resulting from these experiments, a significant performance gain in comparison to stiff carriers becomes evident.
AbstractList This paper describes the potential of a membrane carrier upgrade for legacy CMP tools, such as an IPEC 472. Seventeen different polish parameter settings were applied for both, 150 mm and 200 mm wafers in order to cover a wide range of applications. Resulting from these experiments, a significant performance gain in comparison to stiff carriers becomes evident.
Author Wachsmuth, Holger
Schubert, Ina
Trojan, Dan
Junghans, Romy
Rudolph, Catharina
VanDevender, Barrie
Wrschka, Peter
Franz, Mathias
Martinka, Ronny
Gottfried, Knut Christoph
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