Ferroelectric-Gate Thin-Film Transistor Fabricated by Total Solution Deposition Process

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Published inJapanese Journal of Applied Physics Vol. 50; no. 4S; p. 4
Main Authors Miyasako, Takaaki, Trinh, Bui Nguyen Quoc, Onoue, Masatoshi, Kaneda, Toshihiko, Tue, Phan Trong, Tokumitsu, Eisuke, Shimoda, Tatsuya
Format Journal Article
LanguageEnglish
Japanese
Published 01.04.2011
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Author Kaneda, Toshihiko
Miyasako, Takaaki
Trinh, Bui Nguyen Quoc
Onoue, Masatoshi
Tokumitsu, Eisuke
Shimoda, Tatsuya
Tue, Phan Trong
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Title Ferroelectric-Gate Thin-Film Transistor Fabricated by Total Solution Deposition Process
Volume 50
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