The Temperature Optimization in RF Heating for a MOCVD Susceptor By Using Numerical Methods

This analysis of numerical simulation indicates that the temperature distribution is greatly affected by the different distance between the coil and bottom susceptor as well as the coil spaces in a RF MOCVD reactor. This paper concludes that the uniformity in temperature difference with only 2.6 K o...

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Published inECS transactions Vol. 60; no. 1; pp. 1007 - 1013
Main Authors Lu, Jin Fu, Hu, Chih Kai, Li, Tomi T.
Format Journal Article
LanguageEnglish
Published 27.02.2014
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Abstract This analysis of numerical simulation indicates that the temperature distribution is greatly affected by the different distance between the coil and bottom susceptor as well as the coil spaces in a RF MOCVD reactor. This paper concludes that the uniformity in temperature difference with only 2.6 K on the surface of the susceptor can be achieved by adjusting the geometry of coil arrangements. This finding can be also used for a large-size susceptor of reactor for RF MOCVD system in an optimized process.
AbstractList This analysis of numerical simulation indicates that the temperature distribution is greatly affected by the different distance between the coil and bottom susceptor as well as the coil spaces in a RF MOCVD reactor. This paper concludes that the uniformity in temperature difference with only 2.6 K on the surface of the susceptor can be achieved by adjusting the geometry of coil arrangements. This finding can be also used for a large-size susceptor of reactor for RF MOCVD system in an optimized process.
Author Li, Tomi T.
Lu, Jin Fu
Hu, Chih Kai
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