Room-Temperature Cosputtered HfO[sub 2]–Al[sub 2]O[sub 3] Multicomponent Gate Dielectrics

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Bibliographic Details
Published inElectrochemical and solid-state letters Vol. 12; no. 10; p. G65
Main Authors Pei, Z. L., Pereira, L., Gonçalves, G., Barquinha, P., Franco, N., Alves, E., Rego, A. M. B., Martins, R., Fortunato, E.
Format Journal Article
LanguageEnglish
Published 2009
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ISSN:1099-0062
DOI:10.1149/1.3186643