Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films
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Published in | Japanese Journal of Applied Physics Vol. 51; no. 8S1; p. 8 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
01.08.2012
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Online Access | Get full text |
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Author | Delattre, Pierre-Alexandre Pouliquen, Sylvain Booth, Jean-Paul Johnson, Erik V. |
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Author_xml | – sequence: 1 givenname: Erik V. surname: Johnson fullname: Johnson, Erik V. – sequence: 2 givenname: Sylvain surname: Pouliquen fullname: Pouliquen, Sylvain – sequence: 3 givenname: Pierre-Alexandre surname: Delattre fullname: Delattre, Pierre-Alexandre – sequence: 4 givenname: Jean-Paul surname: Booth fullname: Booth, Jean-Paul |
BookMark | eNpFkFFPwjAQxxuDiYC--twvsNl267r5RkBEgoFE1MeldDes6dalLSZ8IT-nQ0x8ulzuf7_L_UZo0NoWELqlJBY8E3fL5WQTcxqTfDEn9AINaZKKKCUZH6AhIYxGacHYFRp5_9m3GU_pEH1vpTbWQYXfrAlyD_hdfkFtXYNn0Fmvg7YttjV-1spZ5Y4-SGN0C_hFG6362fZDt3iuTeNx7WyDF8fK2T200UybQ-jBfVD2edlW_zsQnKzNwTpdwT1ed8GCARWcbbXCG2c7cEGDPx3-RV-jy1oaDzd_dYxe5w_b6SJarR-fppNVpCjheZQwkrGdKCilogCAHXBCBKszRirgu4ylDFSRMa4Ez1mesrogIFmSVRUXTBTJGMVnbv-s9w7qsnO6ke5YUlKeLJcnyyWn5dly8gNmmnUF |
Cites_doi | 10.1143/JJAP.47.7308 10.1088/0963-0252/16/2/007 10.1088/0963-0252/18/2/025009 10.1063/1.3505794 10.1002/pssc.200982798 10.1063/1.1596364 10.1002/pssr.200802106 10.1007/s003390050987 10.1088/0963-0252/19/1/015012 10.1088/0022-3727/42/9/092005 10.1002/pip.1157 10.1143/JJAP.38.6047 10.1016/S0927-0248(99)00140-3 10.1088/0022-3727/43/41/412001 10.1063/1.3223310 10.1016/j.jnoncrysol.2012.01.014 10.1143/JJAP.37.L1116 10.1016/S0022-3093(01)00995-4 10.1116/1.1450585 |
ContentType | Journal Article |
DBID | AAYXX CITATION |
DOI | 10.7567/JJAP.51.08HF01 |
DatabaseName | CrossRef |
DatabaseTitle | CrossRef |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering Physics |
EISSN | 1347-4065 |
ExternalDocumentID | 10_7567_JJAP_51_08HF01 |
GroupedDBID | 4.4 AALHV AAYXX ACGFS ACNCT ALMA_UNASSIGNED_HOLDINGS ATQHT CITATION F5P IOP IZVLO KOT MC8 N5L QTG RNS SJN |
ID | FETCH-LOGICAL-c1058-32062b7911179eeebe50072f620de5b6242ec9625c7582842f90ea236dd572793 |
ISSN | 0021-4922 |
IngestDate | Fri Aug 23 02:32:34 EDT 2024 |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 8S1 |
Language | English |
LinkModel | OpenURL |
MergedId | FETCHMERGED-LOGICAL-c1058-32062b7911179eeebe50072f620de5b6242ec9625c7582842f90ea236dd572793 |
ParticipantIDs | crossref_primary_10_7567_JJAP_51_08HF01 |
PublicationCentury | 2000 |
PublicationDate | 2012-08-01 |
PublicationDateYYYYMMDD | 2012-08-01 |
PublicationDate_xml | – month: 08 year: 2012 text: 2012-08-01 day: 01 |
PublicationDecade | 2010 |
PublicationTitle | Japanese Journal of Applied Physics |
PublicationYear | 2012 |
References | 13 E. V. Johnson (12) 2011; 1339 15 17 A. Abramov (16) 2010; 7 18 19 J. Schulze (6) 2009; 42 F. L. Buzzi (7) 2009; 18 1 2 3 4 5 M. M. Patterson (14) 2007; 16 I. T. Martin (8) 2010; 19 9 20 10 E. V. Johnson (11) 2010; 43 21 |
References_xml | – ident: 20 doi: 10.1143/JJAP.47.7308 – volume: 16 start-page: 257 issn: 0963-0252 year: 2007 ident: 14 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/16/2/007 contributor: fullname: M. M. Patterson – volume: 18 start-page: 025009 issn: 0963-0252 year: 2009 ident: 7 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/18/2/025009 contributor: fullname: F. L. Buzzi – ident: 9 doi: 10.1063/1.3505794 – volume: 7 start-page: 529 issn: 1610-1634 year: 2010 ident: 16 publication-title: Phys. Status Solidi C doi: 10.1002/pssc.200982798 contributor: fullname: A. Abramov – volume: 1339 year: 2011 ident: 12 publication-title: MRS Proc. contributor: fullname: E. V. Johnson – ident: 19 doi: 10.1063/1.1596364 – ident: 15 – ident: 18 doi: 10.1002/pssr.200802106 – ident: 3 doi: 10.1007/s003390050987 – volume: 19 start-page: 015012 issn: 0963-0252 year: 2010 ident: 8 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/19/1/015012 contributor: fullname: I. T. Martin – volume: 42 start-page: 092005 issn: 0022-3727 year: 2009 ident: 6 publication-title: J. Phys. D doi: 10.1088/0022-3727/42/9/092005 contributor: fullname: J. Schulze – ident: 10 doi: 10.1002/pip.1157 – ident: 17 doi: 10.1143/JJAP.38.6047 – ident: 4 doi: 10.1016/S0927-0248(99)00140-3 – volume: 43 start-page: 412001 issn: 0022-3727 year: 2010 ident: 11 publication-title: J. Phys. D doi: 10.1088/0022-3727/43/41/412001 contributor: fullname: E. V. Johnson – ident: 5 doi: 10.1063/1.3223310 – ident: 13 doi: 10.1016/j.jnoncrysol.2012.01.014 – ident: 1 doi: 10.1143/JJAP.37.L1116 – ident: 21 doi: 10.1016/S0022-3093(01)00995-4 – ident: 2 doi: 10.1116/1.1450585 |
SSID | ssj0026541 ssj0026590 ssj0026540 ssj0064762 |
Score | 1.9771779 |
SourceID | crossref |
SourceType | Aggregation Database |
StartPage | 8 |
Title | Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films |
Volume | 51 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Lj9MwELbKIiQ4IFhAvOUDEocqpXHsOOa2sFSlEuxK-2BvUR6OFBElqyhdqfwgfhq_g5nYebTqYeESNWltJ51P45nJNzOEvJNerIIg9ZxYxr7DuVCOEjJxuDv30owFPs8wDvntu7-84KsrcTWZ_BmxltZNPEt-7c0r-R-pwjWQK2bJ_oNk-0nhAnwG-cIRJAzH28k4ysHdBpPxsioaJN_8iG40WqGgRjo2VstxQdZdUm_AEixas_IsLwABZdu1c7rIC6zKgHkmy01aV7Ccc5zDfaMtmiMZ1vA7uzG6qaOsWFd1nraJ7SfXTTXupoPh_RrrtOLS7eRbFjDsztj1crrHFG7pqAP73nbvsur65_Ry1ity7OOOHPA2eLspbqK8B_kx0vsam7wGm36tHZvFM_B8P1WViSetdFQ6PTvSRj-QRhJ00Y8uGwF8YGVym2faKHGPS_CLTQ-KTssLd4Tm4MwdKe1g31YihY8vs1ero9OZwDKvy4Vdd6tm985e2jMcwbfCGUIcHwo3NOPvkLtMKoHU068np31gwBdYcGc4cUcnqv_G59K3xe_NI5sapLjMh-3bHNlYI2Pp_BF5aEVLjwxkH5OJLg_Jg1Hty0Nyzwr7CfndwZhaGNMOxnSAMa0yugtjaiFJEca0RRpFGNNdGFMDYwoYGMaMYfyRboOYDiDGhdupn5KLxZfzz0vHtg9xEnAaAsdjc5_FEndzqbQGbSWwTn7ms3mqRYyJUTpR4P8nEt8dc5apuY6Y56epAKteec_IQVmV-jmhXKYZbFYsymTAM3BLEqG49FgqwcHOWPKCvO_-8PDaVIkJ9yPg5a1_-YrcHwD_mhw09Vq_AQO4id-26PkLgc-yeQ |
link.rule.ids | 315,786,790,27955,27956 |
linkProvider | IOP Publishing |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Tailored+Voltage+Waveform+Deposition+of+Microcrystalline+Silicon+Thin+Films+from+Hydrogen-Diluted+Silane+and+Silicon+Tetrafluoride%3A+Optoelectronic+Properties+of+Films&rft.jtitle=Japanese+Journal+of+Applied+Physics&rft.au=Johnson%2C+Erik+V.&rft.au=Pouliquen%2C+Sylvain&rft.au=Delattre%2C+Pierre-Alexandre&rft.au=Booth%2C+Jean-Paul&rft.date=2012-08-01&rft.issn=0021-4922&rft.eissn=1347-4065&rft.volume=51&rft.issue=8S1&rft.spage=8&rft_id=info:doi/10.7567%2FJJAP.51.08HF01&rft.externalDBID=n%2Fa&rft.externalDocID=10_7567_JJAP_51_08HF01 |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0021-4922&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0021-4922&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0021-4922&client=summon |