Crack-free high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT on sapphire with record low sheet resistance
In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT structure grown on a sapphire substrate with ultra-low sheet resistivity (<250 \Omega / \Box ) is reported. Optimization of growth conditions, such as reduced growth rate, low carbon incorporation, and thickn...
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Abstract | In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT structure grown on a sapphire substrate with ultra-low sheet resistivity (<250 \Omega / \Box ) is reported. Optimization of growth conditions, such as reduced growth rate, low carbon incorporation, and thickness optimization of different epitaxial layers allowed to grow a crack-free high composition and thick AlGaN barrier layer HEMT structure. A significantly high two-dimensional electron gas (2DEG) density of 1.46 \times 10^{13} cm^{-2} with a room temperature mobility of 1710 cm^{2}/V.s is obtained by Hall measurement using the Van-Der-Pauw method. These state-of-the-art results show great potential for high-power Ga-polar HEMT design on the sapphire substrate. |
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AbstractList | Crystals 2023, 13(10), 1456 In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN
HEMT structure grown on a sapphire substrate with ultra-low sheet resistivity
(<250 \Omega / \Box ) is reported. Optimization of growth conditions, such as
reduced growth rate, low carbon incorporation, and thickness optimization of
different epitaxial layers allowed to grow a crack-free high composition and
thick AlGaN barrier layer HEMT structure. A significantly high two-dimensional
electron gas (2DEG) density of 1.46 \times 10^{13} cm^{-2} with a room
temperature mobility of 1710 cm^{2}/V.s is obtained by Hall measurement using
the Van-Der-Pauw method. These state-of-the-art results show great potential
for high-power Ga-polar HEMT design on the sapphire substrate. In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT structure grown on a sapphire substrate with ultra-low sheet resistivity (<250 \Omega / \Box ) is reported. Optimization of growth conditions, such as reduced growth rate, low carbon incorporation, and thickness optimization of different epitaxial layers allowed to grow a crack-free high composition and thick AlGaN barrier layer HEMT structure. A significantly high two-dimensional electron gas (2DEG) density of 1.46 \times 10^{13} cm^{-2} with a room temperature mobility of 1710 cm^{2}/V.s is obtained by Hall measurement using the Van-Der-Pauw method. These state-of-the-art results show great potential for high-power Ga-polar HEMT design on the sapphire substrate. |
Author | Gupta, Chirag Bai, Ruixin Mukhopadhyay, Swarnav Chen, Jiahao Wang, Guangying Liu, Cheng Sanyal, Surjava Pasayat, Shubhra |
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BackLink | https://doi.org/10.48550/arXiv.2304.05593$$DView paper in arXiv https://doi.org/10.3390/cryst13101456$$DView published paper (Access to full text may be restricted) |
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DOI | 10.48550/arxiv.2304.05593 |
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Snippet | In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT structure grown on a sapphire substrate with ultra-low sheet resistivity... Crystals 2023, 13(10), 1456 In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT structure grown on a sapphire substrate with... |
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SubjectTerms | Aluminum gallium nitrides Aluminum nitride Barrier layers Composition Electron gas Epitaxial growth Epitaxial layers Gallium nitrides Hall effect High electron mobility transistors Optimization Physics - Applied Physics Physics - Materials Science Room temperature Sapphire Substrates |
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Title | Crack-free high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT on sapphire with record low sheet resistance |
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