Moiré Engineering in 2D Heterostructures with Process-Induced Strain
We report deterministic control over moiré superlattice interference pattern in twisted bilayer graphene by implementing designable device-level heterostrain with process-induced strain engineering, a widely used technique in industrial silicon nanofabrication processes. By depositing stressed thin...
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Published in | arXiv.org |
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Main Authors | , , , , , , , , |
Format | Paper Journal Article |
Language | English |
Published |
Ithaca
Cornell University Library, arXiv.org
03.04.2023
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Subjects | |
Online Access | Get full text |
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