APA (7th ed.) Citation

Budinska, B., Aichner, B., Vodolazov, D. Y., Mikhailov, M. Y., Porrati, F., Huth, M., . . . Dobrovolskiy, O. V. (2021, November 26). Rising speed limits for fluxons via edge quality improvement in wide MoSi thin films. arXiv.org. https://doi.org/10.48550/arxiv.2111.13431

Chicago Style (17th ed.) Citation

Budinska, B., B. Aichner, D Yu Vodolazov, M Yu Mikhailov, F. Porrati, M. Huth, A V. Chumak, W. Lang, and O V. Dobrovolskiy. "Rising Speed Limits for Fluxons via Edge Quality Improvement in Wide MoSi Thin Films." ArXiv.org 26 Nov. 2021. https://doi.org/10.48550/arxiv.2111.13431.

MLA (9th ed.) Citation

Budinska, B., et al. "Rising Speed Limits for Fluxons via Edge Quality Improvement in Wide MoSi Thin Films." ArXiv.org, 26 Nov. 2021, https://doi.org/10.48550/arxiv.2111.13431.