Large Physisorption Strain in Chemical Vapor Deposition of Graphene on Copper Substrates - He, Rui; Zhao, Liuyan; Petrone, Nicholas; Kim, Keun Soo; Roth, Michael; Hone, James; Kim, Philip; Pasupathy, Abhay; Pinczuk, Aron (Nano letters, 2012)
Keywords: CHEMICAL VAPOR DEPOSITION; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Compressive properties; COMPUTER SIMULATION; Copper; Cross-disciplinary physics: materials science; rheology; DEPOSITION; Exact sciences and technology; Fullerenes and related materials; diamonds, graphite; Graphene; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; MICA; MICROSTRUCTURES; Molecular dynamics; Nanostructure; Nonuniform; Physics; PROPERTIES; Simulation; Specific materials; STRAIN; VAPOR DEPOSITION; CVD; strain; copper; Graphene; Monocrystals; Digital simulation; Molecular dynamics method; Theoretical study; Copper; Raman spectroscopy; Physisorption