Adsorption States of Dialkyl Ditelluride Autooxidized Monolayers on Au(111)
Organic ditellurides (R2Te2 where R = n-butyl (C4), n-octyl (C8), and n-cetyl (C16)) were synthesized, and their adsorption states after oxidation on Au(111) surfaces were studied by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), theoretical analyses, near-edge...
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Published in | Langmuir Vol. 21; no. 8; pp. 3344 - 3353 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
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Washington, DC
American Chemical Society
12.04.2005
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Abstract | Organic ditellurides (R2Te2 where R = n-butyl (C4), n-octyl (C8), and n-cetyl (C16)) were synthesized, and their adsorption states after oxidation on Au(111) surfaces were studied by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), theoretical analyses, near-edge X-ray absorption fine structure (NEXAFS) measurements, contact angle measurements, and atomic force microscopy (AFM). The obtained results show that dialkyl ditellurides form autooxidized monolayers (AMs) on the surfaces under ambient conditions and that the oxidation process is accelerated by ambient light. XPS, UPS, and theoretical analyses suggest that the autooxidized ditelluride species consist of polymers or oligomers with Te−O−Te−O network structures stabilized by oxygen bridges between tellurium molecules following the cleavage of tellurium−gold bonds. NEXAFS and contact angle measurements indicate that the average tilt angles of the alkyl chains from the surface normal are smaller for the AMs of dialkyl ditellurides having longer alkyl chains. AFM measurements show defects and roughness features around a few angstroms in height on the surfaces of the dialkyl ditelluride AMs. |
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AbstractList | Organic ditellurides (R2Te2 where R = n-butyl (C4), n-octyl (C8), and n-cetyl (C16)) were synthesized, and their adsorption states after oxidation on Au(111) surfaces were studied by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), theoretical analyses, near-edge X-ray absorption fine structure (NEXAFS) measurements, contact angle measurements, and atomic force microscopy (AFM). The obtained results show that dialkyl ditellurides form autooxidized monolayers (AMs) on the surfaces under ambient conditions and that the oxidation process is accelerated by ambient light. XPS, UPS, and theoretical analyses suggest that the autooxidized ditelluride species consist of polymers or oligomers with Te−O−Te−O network structures stabilized by oxygen bridges between tellurium molecules following the cleavage of tellurium−gold bonds. NEXAFS and contact angle measurements indicate that the average tilt angles of the alkyl chains from the surface normal are smaller for the AMs of dialkyl ditellurides having longer alkyl chains. AFM measurements show defects and roughness features around a few angstroms in height on the surfaces of the dialkyl ditelluride AMs. Organic ditellurides (R2Te2 where R = n-butyl (C4), n-octyl (C8), and n-cetyl (C16)) were synthesized, and their adsorption states after oxidation on Au(111) surfaces were studied by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), theoretical analyses, near-edge X-ray absorption fine structure (NEXAFS) measurements, contact angle measurements, and atomic force microscopy (AFM). The obtained results show that dialkyl ditellurides form autooxidized monolayers (AMs) on the surfaces under ambient conditions and that the oxidation process is accelerated by ambient light. XPS, UPS, and theoretical analyses suggest that the autooxidized ditelluride species consist of polymers or oligomers with Te-O-Te-O network structures stabilized by oxygen bridges between tellurium molecules following the cleavage of tellurium-gold bonds. NEXAFS and contact angle measurements indicate that the average tilt angles of the alkyl chains from the surface normal are smaller for the AMs of dialkyl ditellurides having longer alkyl chains. AFM measurements show defects and roughness features around a few angstroms in height on the surfaces of the dialkyl ditelluride AMs. |
Author | Yasuda, Satoshi Kobayashi, Nobuhiko Yoshimura, Daisuke Matsumoto, Mutsuyoshi Nakamura, Tohru Kawamoto, Tohru Nozoye, Hisakazu Kondoh, Hiroshi Nakai, Ikuyo Ohta, Toshiaki Miyamae, Takayuki |
Author_xml | – sequence: 1 givenname: Tohru surname: Nakamura fullname: Nakamura, Tohru – sequence: 2 givenname: Takayuki surname: Miyamae fullname: Miyamae, Takayuki – sequence: 3 givenname: Ikuyo surname: Nakai fullname: Nakai, Ikuyo – sequence: 4 givenname: Hiroshi surname: Kondoh fullname: Kondoh, Hiroshi – sequence: 5 givenname: Tohru surname: Kawamoto fullname: Kawamoto, Tohru – sequence: 6 givenname: Nobuhiko surname: Kobayashi fullname: Kobayashi, Nobuhiko – sequence: 7 givenname: Satoshi surname: Yasuda fullname: Yasuda, Satoshi – sequence: 8 givenname: Daisuke surname: Yoshimura fullname: Yoshimura, Daisuke – sequence: 9 givenname: Toshiaki surname: Ohta fullname: Ohta, Toshiaki – sequence: 10 givenname: Hisakazu surname: Nozoye fullname: Nozoye, Hisakazu – sequence: 11 givenname: Mutsuyoshi surname: Matsumoto fullname: Matsumoto, Mutsuyoshi |
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Keywords | Monolayer Atomic force microscopy Gold Oxygen Roughness Polymer Transition metal X ray Contact angle Oligomer Fine structure Tilt angle Adsorption Alkyl Defect Photoelectron spectrometry Oxidation |
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Snippet | Organic ditellurides (R2Te2 where R = n-butyl (C4), n-octyl (C8), and n-cetyl (C16)) were synthesized, and their adsorption states after oxidation on Au(111)... |
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SubjectTerms | Chemistry Exact sciences and technology General and physical chemistry Surface physical chemistry |
Title | Adsorption States of Dialkyl Ditelluride Autooxidized Monolayers on Au(111) |
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