Demonstration of a Directly Photopatternable Spin-On-Glass Based on Hydrogen Silsesquioxane and Photobase Generators

• Published in: Macromolecules Vol. 31; no. 15; pp. 4798 - 4805
• Main Authors: Harkness, Brian R, Takeuchi, Kasumi, Tachikawa, Mamoru
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 28.07.1998
• Subjects: Applied sciences; Exact sciences and technology; Physicochemistry of polymers; Polymers and radiations; Properties and characterization; Resolving power; Photosensitivity; Base catalysis; Silsesquioxane polymer; Crosslinking; Experimental study; Organic carbamate; Thermal stability; Pyridine derivatives; Photogeneration; Concentration effect; Photolithography; Photoresist

A commercially available spin-on-glass material, hydrogen silsesquioxane, has been rendered photopatternable to micrometer dimensions by the introduction of a photobase generator at concentrations of <5 wt %. The cure process proceeds via hydrolysis of the silyl hydride linkage by residual water...