Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

• Published in: Physics research international Vol. 2012; no. 2012; pp. 1 - 11
• Main Authors: Mizoguchi, Hakaru, Yanagida, Tatsuya, Hori, Tsukasa, Fujimoto, Junichi
• Format: Journal Article
• Language: English
• Published: Cairo, Egypt Hindawi Puplishing Corporation 01.09.2012; Hindawi Publishing Corporation

Since 2002, we have been developing a carbon dioxide (CO2) laser-produced tin (Sn) plasma (LPP) extreme ultraviolet (EUV) light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W) light source for high volume manufacturing. EUV lithography is used fo...