APA (7th ed.) Citation

Shu, H., Chen, X., Tao, X., & Ding, F. (2012). Edge Structural Stability and Kinetics of Graphene Chemical Vapor Deposition Growth. ACS nano, 6(4), 3243-3250. https://doi.org/10.1021/nn300726r

Chicago Style (17th ed.) Citation

Shu, Haibo, Xiaoshuang Chen, Xiaoming Tao, and Feng Ding. "Edge Structural Stability and Kinetics of Graphene Chemical Vapor Deposition Growth." ACS Nano 6, no. 4 (2012): 3243-3250. https://doi.org/10.1021/nn300726r.

MLA (9th ed.) Citation

Shu, Haibo, et al. "Edge Structural Stability and Kinetics of Graphene Chemical Vapor Deposition Growth." ACS Nano, vol. 6, no. 4, 2012, pp. 3243-3250, https://doi.org/10.1021/nn300726r.