Spontaneous Crack Healing in Nanostructured Silica-Based Thin Films
Self-healing materials that can spontaneously repair damage under mild conditions are desirable in many applications. Significant progress has recently been made in the design of polymer materials capable of healing cracks at the molecular scale using reversible bonds; however, such a self-healing m...
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| Published in | ACS nano Vol. 11; no. 10; pp. 10289 - 10294 |
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| Main Authors | , , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
United States
American Chemical Society
24.10.2017
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| Subjects | |
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| Abstract | Self-healing materials that can spontaneously repair damage under mild conditions are desirable in many applications. Significant progress has recently been made in the design of polymer materials capable of healing cracks at the molecular scale using reversible bonds; however, such a self-healing mechanism has rarely been applied to rigid inorganic materials. Here, we demonstrate the self-healing ability of lamellar silica-based thin films formed by self-assembly of silica precursors and quaternary ammonium-type surfactants. Specifically, spontaneous healing of cracks (typically less than 1.5 μm in width) was achieved under humid conditions even at room temperature. The randomly oriented lamellar structure with thin silica layers is suggested to play an essential role in crack closure and the reformation of siloxane networks on the fracture surface. These findings will lead to the creation of smart self-healing silica-based materials based on reversible siloxane bonds. |
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| AbstractList | Self-healing materials that can spontaneously repair damage under mild conditions are desirable in many applications. Significant progress has recently been made in the design of polymer materials capable of healing cracks at the molecular scale using reversible bonds; however, such a self-healing mechanism has rarely been applied to rigid inorganic materials. Here, we demonstrate the self-healing ability of lamellar silica-based thin films formed by self-assembly of silica precursors and quaternary ammonium-type surfactants. Specifically, spontaneous healing of cracks (typically less than 1.5 μm in width) was achieved under humid conditions even at room temperature. The randomly oriented lamellar structure with thin silica layers is suggested to play an essential role in crack closure and the reformation of siloxane networks on the fracture surface. These findings will lead to the creation of smart self-healing silica-based materials based on reversible siloxane bonds. Self-healing materials that can spontaneously repair damage under mild conditions are desirable in many applications. Significant progress has recently been made in the design of polymer materials capable of healing cracks at the molecular scale using reversible bonds; however, such a self-healing mechanism has rarely been applied to rigid inorganic materials. Here, we demonstrate the self-healing ability of lamellar silica-based thin films formed by self-assembly of silica precursors and quaternary ammonium-type surfactants. Specifically, spontaneous healing of cracks (typically less than 1.5 μm in width) was achieved under humid conditions even at room temperature. The randomly oriented lamellar structure with thin silica layers is suggested to play an essential role in crack closure and the reformation of siloxane networks on the fracture surface. These findings will lead to the creation of smart self-healing silica-based materials based on reversible siloxane bonds.Self-healing materials that can spontaneously repair damage under mild conditions are desirable in many applications. Significant progress has recently been made in the design of polymer materials capable of healing cracks at the molecular scale using reversible bonds; however, such a self-healing mechanism has rarely been applied to rigid inorganic materials. Here, we demonstrate the self-healing ability of lamellar silica-based thin films formed by self-assembly of silica precursors and quaternary ammonium-type surfactants. Specifically, spontaneous healing of cracks (typically less than 1.5 μm in width) was achieved under humid conditions even at room temperature. The randomly oriented lamellar structure with thin silica layers is suggested to play an essential role in crack closure and the reformation of siloxane networks on the fracture surface. These findings will lead to the creation of smart self-healing silica-based materials based on reversible siloxane bonds. |
| Author | Hara, Shintaro Kobayashi, Maho Shimojima, Atsushi Wada, Hiroaki Itoh, Shun Kodama, Satoshi Kuroda, Kazuyuki |
| AuthorAffiliation | Department of Advanced Science and Engineering, Faculty of Science and Engineering Waseda University Kagami Memorial Research Institute for Materials Science and Technology Department of Applied Chemistry, Faculty of Science and Engineering |
| AuthorAffiliation_xml | – name: Waseda University – name: Department of Advanced Science and Engineering, Faculty of Science and Engineering – name: Kagami Memorial Research Institute for Materials Science and Technology – name: Department of Applied Chemistry, Faculty of Science and Engineering |
| Author_xml | – sequence: 1 givenname: Shun surname: Itoh fullname: Itoh, Shun – sequence: 2 givenname: Satoshi surname: Kodama fullname: Kodama, Satoshi – sequence: 3 givenname: Maho surname: Kobayashi fullname: Kobayashi, Maho – sequence: 4 givenname: Shintaro surname: Hara fullname: Hara, Shintaro – sequence: 5 givenname: Hiroaki surname: Wada fullname: Wada, Hiroaki – sequence: 6 givenname: Kazuyuki orcidid: 0000-0002-1602-0335 surname: Kuroda fullname: Kuroda, Kazuyuki organization: Waseda University – sequence: 7 givenname: Atsushi orcidid: 0000-0003-2863-1587 surname: Shimojima fullname: Shimojima, Atsushi email: shimojima@waseda.jp |
| BackLink | https://www.ncbi.nlm.nih.gov/pubmed/28957633$$D View this record in MEDLINE/PubMed |
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| Title | Spontaneous Crack Healing in Nanostructured Silica-Based Thin Films |
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