Ultrathin Epitaxial Graphite:  2D Electron Gas Properties and a Route toward Graphene-based Nanoelectronics

We have produced ultrathin epitaxial graphite films which show remarkable 2D electron gas (2DEG) behavior. The films, composed of typically three graphene sheets, were grown by thermal decomposition on the (0001) surface of 6H−SiC, and characterized by surface science techniques. The low-temperature...

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Published inThe journal of physical chemistry. B Vol. 108; no. 52; pp. 19912 - 19916
Main Authors Berger, Claire, Song, Zhimin, Li, Tianbo, Li, Xuebin, Ogbazghi, Asmerom Y, Feng, Rui, Dai, Zhenting, Marchenkov, Alexei N, Conrad, Edward H, First, Phillip N, de Heer, Walt A
Format Journal Article
LanguageEnglish
Published American Chemical Society 30.12.2004
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Summary:We have produced ultrathin epitaxial graphite films which show remarkable 2D electron gas (2DEG) behavior. The films, composed of typically three graphene sheets, were grown by thermal decomposition on the (0001) surface of 6H−SiC, and characterized by surface science techniques. The low-temperature conductance spans a range of localization regimes according to the structural state (square resistance 1.5 kΩ to 225 kΩ at 4 K, with positive magnetoconductance). Low-resistance samples show characteristics of weak localization in two dimensions, from which we estimate elastic and inelastic mean free paths. At low field, the Hall resistance is linear up to 4.5 T, which is well-explained by n-type carriers of density 1012 cm-2 per graphene sheet. The most highly ordered sample exhibits Shubnikov−de Haas oscillations that correspond to nonlinearities observed in the Hall resistance, indicating a potential new quantum Hall system. We show that the high-mobility films can be patterned via conventional lithographic techniques, and we demonstrate modulation of the film conductance using a top-gate electrode. These key elements suggest electronic device applications based on nanopatterned epitaxial graphene (NPEG), with the potential for large-scale integration.
Bibliography:istex:09B8E8D924D719FF7EB0464521ECC35B7410AFAC
ark:/67375/TPS-ZRTNQVG0-7
ISSN:1520-6106
1520-5207
DOI:10.1021/jp040650f