Soft Ultraviolet (UV) Photopatterning and Metallization of Self-Assembled Monolayers (SAMs) Formed from the Lipoic Acid Ester of α‑Hydroxy-1-acetylpyrene: The Generality of Acid-Catalyzed Removal of Thiol-on-Gold SAMs using Soft UV Light

• Published in: ACS applied materials & interfaces Vol. 9; no. 21; pp. 18388 - 18397
• Main Authors: Pukenas, Laurynas, Prompinit, Panida, Nishitha, Boda, Tate, Daniel J, Singh, N. D. Pradeep, Wälti, Christoph, Evans, Stephen D, Bushby, Richard J
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 31.05.2017
• Subjects: photochemical deprotection; electrochemical metallization; lipoic acid; soft UV photolithography; self-assembled monolayers; 1-acetylpyrene

Under a layer of 0.1 M HCl in isopropanol, soft ultraviolet (UV) (365 nm) photolysis of the thiol-on-gold self-assembled monolayer (SAM) derived from the lipoic acid ester of α-hydroxy-1-acetylpyrene results in the expected removal of the acetylpyrene protecting group. When photolyzing through a mas...