A methodology to improve timing yield in the presence of process variations

The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing uncertainty in the performance of CMOS circuits. Accounting for the worst case values of all parameters will result in a...

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Published in2004 41st Conference Design Automation pp. 448 - 453
Main Authors Raj, Sreeja, Vrudhula, Sarma B. K., Wang, Janet
Format Conference Proceeding
LanguageEnglish
Published New York, NY, USA ACM 01.01.2004
IEEE
Association for Computing Machinery
SeriesACM Conferences
Subjects
Online AccessGet full text
ISBN1581138288
9781581138283
1511838288
ISSN0738-100X
DOI10.1145/996566.996694

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Abstract The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing uncertainty in the performance of CMOS circuits. Accounting for the worst case values of all parameters will result in an unacceptably low timing yield. Design for Variability, which involves designing to achieve a given level of confidence in the performance of ICs, is fast becoming an indispensable part of IC design methodology. This paper describes a method to identify certain paths in the circuit that are responsible for the spread of timing performance. The method is based on defining a disutility function of the gate and path delays, which includes both the means and variances of the delay random variables. Based on the moments of this disutility function, an algorithm is presented which selects a subset of paths (called undominated paths) as being most responsible for the variation in timing performance. Next, a statistical gate sizing algorithm is presented, which is aimed at minimizing the delay variability of the nodes in the selected paths subject to constraints on the critical path delay and the area penalty. Monte-Carlo simulations with ISCAS '85 benchmark circuits show that our statistical optimization approach results in significant improvements in timing yield over traditional deterministic sizing methods.
AbstractList The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing uncertainty in the performance of CMOS circuits. Accounting for the worst case values of all parameters will result in an unacceptably low timing yield. Design for Variability, which involves designing to achieve a given level of confidence in the performance of ICs, is fast becoming an indispensable part of IC design methodology. This paper describes a method to identify certain paths in the circuit that are responsible for the spread of timing performance. The method is based on defining a disutility function of the gate and path delays, which includes both the means and variances of the delay random variables. Based on the moments of this disutility function, an algorithm is presented which selects a subset of paths (called undominated paths) as being most responsible for the variation in timing performance. Next, a statistical gate sizing algorithm is presented, which is aimed at minimizing the delay variability of the nodes in the selected paths subject to constraints on the critical path delay and the area penalty. Monte-Carlo simulations with ISCAS '85 benchmark circuits show that our statistical optimization approach results in significant improvements in timing yield over traditional deterministic sizing methods.
Author Wang, Janet
Raj, Sreeja
Vrudhula, Sarma B. K.
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Keywords timing yield
gate sizing
timing analysis
Performance evaluation
Monte Carlo method
Circuit design
Integrated circuit design
Algorithm
Optimization
Dimensioning
Statistical method
Microelectronic fabrication
Manufacturing process
Critical path
Numerical simulation
Delay time
CMOS integrated circuits
Deterministic approach
Random variable
Computer aided design
Language English
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Snippet The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result,...
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SubjectTerms Applied sciences
Circuits
Delay
Design methodology
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Fabrication
Hardware -- Hardware validation
Integrated circuits
Low power electronics
Microelectronic fabrication (materials and surfaces technology)
Random variables
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Size control
Timing
Uncertainty
Yield estimation
Title A methodology to improve timing yield in the presence of process variations
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