193 nm Photodissociation of Thiophene Probed Using Synchrotron Radiation

The photodissociation dynamics of thiophene, c-C4H4S, have been studied at 193 nm using tunable synchrotron undulator radiation as a universal product probe. Five primary dissociation channels have been observed, and the translational energy distributions and photoionization efficiency spectra have...

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Bibliographic Details
Published inThe journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Vol. 103; no. 42; pp. 8351 - 8358
Main Authors Qi, Fei, Sorkhabi, Osman, Rizvi, Abbas H, Suits, Arthur G
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 21.10.1999
Subjects
40 CHEMISTRY
CHEMICAL REACTION KINETICS
DISSOCIATION
PHOTOCHEMISTRY
SYNCHROTRON RADIATION
THIOPHENE
ULTRAVIOLET RADIATION
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Summary:The photodissociation dynamics of thiophene, c-C4H4S, have been studied at 193 nm using tunable synchrotron undulator radiation as a universal product probe. Five primary dissociation channels have been observed, and the translational energy distributions and photoionization efficiency spectra have been recorded for all products. The evidence suggests that dissociation occurs on the ground-state surface following internal conversion.
Bibliography:ark:/67375/TPS-TH4W1XG7-1
istex:6D948FBC690B69DB63FACC704A2444C56C75A52D
USDOE
AC03-76SF00098
ISSN:1089-5639
1520-5215
DOI:10.1021/jp992057h