Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films

• Published in: Macromolecules Vol. 41; no. 23; pp. 9098 - 9103
• Main Authors: Ji, Shengxiang, Liu, Chi-Chun, Son, Jeong Gon, Gotrik, Kevin, Craig, Gordon S. W, Gopalan, Padma, Himpsel, F. J, Char, Kookheon, Nealey, Paul F
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 09.12.2008
• Subjects: Applied sciences; Exact sciences and technology; Organic polymers; Physicochemistry of polymers; Properties and characterization; Structure, morphology and analysis; Composition effect; Hydroxyethyl methacrylate copolymer; Experimental study; Preferred orientation; Thin film; Surface effect; Random copolymer; Monodispersed polymer; Pyridine(2-vinyl) copolymer; Domain structure; Size effect; Diblock copolymer; Graft polymers; Styrene copolymer

Random copolymer brushes of poly(styrene-r-methyl methacrylate) (PS-r-PMMA) have previously been used to control the wetting behavior of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymer. Here we demonstrate that the use of random copolymer may be generalized to other block copolymer s...