Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats

• Published in: Macromolecules Vol. 44; no. 7; pp. 1876 - 1885
• Main Authors: Liu, Chi-Chun, Han, Eungnak, Onses, M. Serdar, Thode, Christopher J, Ji, Shengxiang, Gopalan, Padma, Nealey, Paul F
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 12.04.2011
• Subjects: Applied sciences; Exact sciences and technology; Machinery and processing; Miscellaneous; Plastics; Polymer industry, paints, wood; Technology of polymers; Surface reaction; End group; Nanoparticle; Immobilization; Solvent extraction; Crosslinked copolymer; Vacuum ultraviolet radiation; Hydroxyl group; Photolithography; Photoresist; Ultrathin films; Patterning; Polymer brush; Nanostructure; Surface topography; Experimental study; Methyl methacrylate copolymer; Metal particle; Chemical coupling; Random copolymer; Glycidyl methacrylate copolymer; Plasma etching; Spin-on coating; Pyridine(2-vinyl) polymer; Styrene copolymer

Chemically patterned surfaces comprised of polymer mats and brushes of well-defined chemistry were fabricated at the length scale of 10 nm. A key concept is the integration of new materials, cross-linked polymer mats, with traditional lithographic processing. Resist was patterned on top of cross-lin...