Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features

• Published in: Macromolecules Vol. 46; no. 4; pp. 1415 - 1424
• Main Authors: Liu, Chi-Chun, Ramírez-Hernández, Abelardo, Han, Eungnak, Craig, Gordon S. W, Tada, Yasuhiko, Yoshida, Hiroshi, Kang, Huiman, Ji, Shengxiang, Gopalan, Padma, de Pablo, Juan J, Nealey, Paul F
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 26.02.2013
• Subjects: Applied sciences; composite polymers; crosslinking; energy; Exact sciences and technology; Monte Carlo method; Organic polymers; Physicochemistry of polymers; polymethylmethacrylate; polystyrenes; Properties and characterization; scanning electron microscopy; Structure, morphology and analysis; styrene; Ultrathin films; Self assembly; Monte Carlo method; Patterning; Interface energy; Computer simulation; Polymer brush; Composition effect; Experimental study; Methyl methacrylate copolymer; Surface effect; Random copolymer; Interface properties; Lamellar structure; Domain structure; Diblock copolymer; Styrene copolymer

Lamellae-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) films, with bulk period L 0, were directed to assemble on lithographically nanopatterned surfaces. The chemical pattern was comprised of “guiding” stripes of cross-linked polystyrene (X-PS) or poly(methyl methacrylate) (X-PMMA)...