Soluble Fullerene-Based n-Channel Organic Thin-Film Transistors Printed by Using a Polydimethylsiloxane Stamp

A polydimethylsiloxane stamp was applied for the first time to the fabrication of n-channel thin-film transistors based on soluble small molecule organic semiconducting materials. The stamping method was found to facilitate film transfer onto a gate insulator surface irrespective of its surface free...

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Published inACS applied materials & interfaces Vol. 3; no. 3; pp. 836 - 841
Main Authors Horii, Yoshinori, Ikawa, Mitsuhiro, Chikamatsu, Masayuki, Azumi, Reiko, Kitagawa, Masahiko, Konishi, Hisatoshi, Yase, Kiyoshi
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 23.03.2011
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Abstract A polydimethylsiloxane stamp was applied for the first time to the fabrication of n-channel thin-film transistors based on soluble small molecule organic semiconducting materials. The stamping method was found to facilitate film transfer onto a gate insulator surface irrespective of its surface free energy. We used [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) and C60-fused N-methylpyrrolidine-meta-dodecyl phenyl (C60MC12) as n-channel materials. The stamped thin-film transistors of C60MC12 achieved a high electron mobility of 0.39 cm2/(V s) and a current on−off ratio of 1 × 107. The mobility of the stamped C60MC12 thin-film transistors did not depend much on the surface free energy of the SiO2 gate insulator with and without surface treatment using a silane-coupling reagent. In particular, the stamped C60MC12 thin-film transistor exhibited a relatively high mobility of 0.1 cm2/(V s) on a high energy surface of untreated SiO2. In addition, a complementary inverter composed of an n-channel and a p-channel stamped thin-film transistor was demonstrated for the first time, which exhibits a maximum gain of 63 at a supply voltage of 50 V.
AbstractList A polydimethylsiloxane stamp was applied for the first time to the fabrication of n-channel thin-film transistors based on soluble small molecule organic semiconducting materials. The stamping method was found to facilitate film transfer onto a gate insulator surface irrespective of its surface free energy. We used [6,6]-phenyl-C(61)-butyric acid methyl ester (PCBM) and C(60)-fused N-methylpyrrolidine-meta-dodecyl phenyl (C60MC12) as n-channel materials. The stamped thin-film transistors of C60MC12 achieved a high electron mobility of 0.39 cm(2)/(V s) and a current on-off ratio of 1 × 10(7). The mobility of the stamped C60MC12 thin-film transistors did not depend much on the surface free energy of the SiO(2) gate insulator with and without surface treatment using a silane-coupling reagent. In particular, the stamped C60MC12 thin-film transistor exhibited a relatively high mobility of 0.1 cm(2)/(V s) on a high energy surface of untreated SiO(2). In addition, a complementary inverter composed of an n-channel and a p-channel stamped thin-film transistor was demonstrated for the first time, which exhibits a maximum gain of 63 at a supply voltage of 50 V.
A polydimethylsiloxane stamp was applied for the first time to the fabrication of n-channel thin-film transistors based on soluble small molecule organic semiconducting materials. The stamping method was found to facilitate film transfer onto a gate insulator surface irrespective of its surface free energy. We used [6,6]-phenyl-C61-butyric acid methyl ester (PCBM) and C60-fused N-methylpyrrolidine-meta-dodecyl phenyl (C60MC12) as n-channel materials. The stamped thin-film transistors of C60MC12 achieved a high electron mobility of 0.39 cm2/(V s) and a current on−off ratio of 1 × 107. The mobility of the stamped C60MC12 thin-film transistors did not depend much on the surface free energy of the SiO2 gate insulator with and without surface treatment using a silane-coupling reagent. In particular, the stamped C60MC12 thin-film transistor exhibited a relatively high mobility of 0.1 cm2/(V s) on a high energy surface of untreated SiO2. In addition, a complementary inverter composed of an n-channel and a p-channel stamped thin-film transistor was demonstrated for the first time, which exhibits a maximum gain of 63 at a supply voltage of 50 V.
Author Kitagawa, Masahiko
Ikawa, Mitsuhiro
Horii, Yoshinori
Azumi, Reiko
Konishi, Hisatoshi
Yase, Kiyoshi
Chikamatsu, Masayuki
AuthorAffiliation Tottori University
National Institute of Advanced Industrial Science and Technology (AIST)
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Issue 3
Keywords organic field-effect transistor
transfer printing
polydimethylsiloxane stamp
self-assembled monolayer
complementary inverter
n-channel material
soluble fullerene derivative
organic semiconductor
Language English
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Snippet A polydimethylsiloxane stamp was applied for the first time to the fabrication of n-channel thin-film transistors based on soluble small molecule organic...
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SubjectTerms Crystallization - methods
Dimethylpolysiloxanes - chemistry
Equipment Design
Equipment Failure Analysis
Fullerenes - chemistry
Materials Testing
Membranes, Artificial
Nanotechnology - methods
Organic Chemicals - chemistry
Solubility
Surface Properties
Transistors, Electronic
Title Soluble Fullerene-Based n-Channel Organic Thin-Film Transistors Printed by Using a Polydimethylsiloxane Stamp
URI http://dx.doi.org/10.1021/am101193y
https://www.ncbi.nlm.nih.gov/pubmed/21366238
https://search.proquest.com/docview/858418104
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