Chemically Tunable Organic Dielectric Layer on an Oxide TFT: Poly(p‑xylylene) Derivatives
Inorganic materials such as SiO x and SiN x are commonly used as dielectric layers in thin-film transistors (TFTs), but recent advancements in TFT devices, such as inclusion in flexible electronics, require the development of novel types of dielectric layers. In this study, CVD-deposited poly(p-xyl...
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Published in | ACS applied materials & interfaces Vol. 13; no. 36; pp. 43123 - 43133 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
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American Chemical Society
15.09.2021
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Abstract | Inorganic materials such as SiO x and SiN x are commonly used as dielectric layers in thin-film transistors (TFTs), but recent advancements in TFT devices, such as inclusion in flexible electronics, require the development of novel types of dielectric layers. In this study, CVD-deposited poly(p-xylylene) (PPx)-based polymers were evaluated as alternative dielectric layers. CVD-deposited PPx can produce thin, conformal, and pinhole-free polymer layers on various surfaces, including oxides and metals, without interfacial defects. Three types of commercial polymers were successfully deposited on various substrates and exhibited stable dielectric properties under frequency and voltage sweeps. Additionally, TFTs with PPx as a dielectric material and an oxide semiconductor exhibited excellent device performance; a mobility as high as 22.72 cm2/(V s), which is the highest value among organic gate dielectric TFTs, to the best of our knowledge. Because of the low-temperature deposition process and its unprecedented mechanical flexibility, TFTs with CVD-deposited PPx were successfully fabricated on a flexible plastic substrate, exhibiting excellent durability over 10000 bending cycles. Finally, a custom-synthesized functionalized PPx was introduced into top-gated TFTs, demonstrating the possibility for expanding this concept to a wide range of chemistries with tunable gate dielectric layers. |
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AbstractList | Inorganic materials such as SiO x and SiN x are commonly used as dielectric layers in thin-film transistors (TFTs), but recent advancements in TFT devices, such as inclusion in flexible electronics, require the development of novel types of dielectric layers. In this study, CVD-deposited poly(p-xylylene) (PPx)-based polymers were evaluated as alternative dielectric layers. CVD-deposited PPx can produce thin, conformal, and pinhole-free polymer layers on various surfaces, including oxides and metals, without interfacial defects. Three types of commercial polymers were successfully deposited on various substrates and exhibited stable dielectric properties under frequency and voltage sweeps. Additionally, TFTs with PPx as a dielectric material and an oxide semiconductor exhibited excellent device performance; a mobility as high as 22.72 cm2/(V s), which is the highest value among organic gate dielectric TFTs, to the best of our knowledge. Because of the low-temperature deposition process and its unprecedented mechanical flexibility, TFTs with CVD-deposited PPx were successfully fabricated on a flexible plastic substrate, exhibiting excellent durability over 10000 bending cycles. Finally, a custom-synthesized functionalized PPx was introduced into top-gated TFTs, demonstrating the possibility for expanding this concept to a wide range of chemistries with tunable gate dielectric layers. |
Author | Park, Jimin Bae, Kihyeon Kim, Hyun-Suk Jang, Seong Cheol Kim, Hyoung-Do Lahann, Joerg Kim, Jaehyun Lee, Kyung Jin |
AuthorAffiliation | Department of Chemical Engineering and Applied Chemistry, College of Engineering Department of Chemical Engineering, College of Engineering Department of Materials Science and, College of Engineering |
AuthorAffiliation_xml | – name: Department of Materials Science and, College of Engineering – name: Department of Chemical Engineering and Applied Chemistry, College of Engineering – name: Department of Chemical Engineering, College of Engineering |
Author_xml | – sequence: 1 givenname: Jaehyun surname: Kim fullname: Kim, Jaehyun organization: Department of Chemical Engineering and Applied Chemistry, College of Engineering – sequence: 2 givenname: Seong Cheol surname: Jang fullname: Jang, Seong Cheol organization: Department of Materials Science and, College of Engineering – sequence: 3 givenname: Kihyeon surname: Bae fullname: Bae, Kihyeon organization: Department of Chemical Engineering and Applied Chemistry, College of Engineering – sequence: 4 givenname: Jimin surname: Park fullname: Park, Jimin organization: Department of Materials Science and, College of Engineering – sequence: 5 givenname: Hyoung-Do surname: Kim fullname: Kim, Hyoung-Do organization: Department of Materials Science and, College of Engineering – sequence: 6 givenname: Joerg surname: Lahann fullname: Lahann, Joerg email: lahann@umich.edu organization: Department of Chemical Engineering, College of Engineering – sequence: 7 givenname: Hyun-Suk orcidid: 0000-0003-4286-7027 surname: Kim fullname: Kim, Hyun-Suk email: khs3297@cnu.ac.kr organization: Department of Materials Science and, College of Engineering – sequence: 8 givenname: Kyung Jin orcidid: 0000-0002-6709-3235 surname: Lee fullname: Lee, Kyung Jin email: kjlee@cnu.ac.kr organization: Department of Chemical Engineering, College of Engineering |
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Title | Chemically Tunable Organic Dielectric Layer on an Oxide TFT: Poly(p‑xylylene) Derivatives |
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