New Tungsten(VI) Guanidinato Complexes:  Synthesis, Characterization, and Application in Metal−Organic Chemical Vapor Deposition of Tungsten Nitride Thin Films

Two new tungsten complexes, [W(NtBu)2(NMe2){(iPrN)2CNMe2}] (2) and [W(NtBu)2(H){(iPrN)2CNMe2}] (3), as precursors for metal−organic chemical vapor deposition (MOCVD) of tungsten nitride thin films were synthesized from the starting compound [W(NtBu)2(Cl){(iPrN)2CNMe2}] (1) by substitution of the chl...

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Bibliographic Details
Published inChemistry of materials Vol. 18; no. 25; pp. 6075 - 6082
Main Authors Rische, Daniel, Parala, Harish, Gemel, Eliza, Winter, Manuela, Fischer, Roland A
Format Journal Article
LanguageEnglish
Published American Chemical Society 12.12.2006
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