New Tungsten(VI) Guanidinato Complexes:  Synthesis, Characterization, and Application in Metal−Organic Chemical Vapor Deposition of Tungsten Nitride Thin Films

• Published in: Chemistry of materials Vol. 18; no. 25; pp. 6075 - 6082
• Main Authors: Rische, Daniel, Parala, Harish, Gemel, Eliza, Winter, Manuela, Fischer, Roland A
• Format: Journal Article
• Language: English
• Published: American Chemical Society 12.12.2006
• DOI: 10.1021/cm061999d
• ISSN: 0897-4756

Two new tungsten complexes, [W(NtBu)2(NMe2){(iPrN)2CNMe2}] (2) and [W(NtBu)2(H){(iPrN)2CNMe2}] (3), as precursors for metal−organic chemical vapor deposition (MOCVD) of tungsten nitride thin films were synthesized from the starting compound [W(NtBu)2(Cl){(iPrN)2CNMe2}] (1) by substitution of the chloro ligand by a dimethylamido and a hydrido group, respectively. Compounds 1 − 3 were characterized by 1H NMR, 13C NMR, EI-MS, IR, and elemental analysis including single-crystal X-ray diffraction studies on 1 and 3. The thermal properties of the compounds were studied by thermogravimetric and differential thermal analysis. Precursors 2 and 3 were compared for the growth of tungsten nitride thin films by MOCVD. The obtained films were characterized by X-ray diffraction and scanning electron microscopy and by depth-profiling the composition with secondary neutron mass spectroscopy. Films grown without ammonia had surprisingly low nitrogen levels, indicating that 2 and 3 are not suited as single-source precursors for pure WN x phases. When ammonia was used as a co reactant gas, the carbon content in the films decreased significantly and crystalline β-W2N was obtained. Interestingly, films grown in the presence of ammonia by amido compound 2 yielded lower carbon contents than films obtained from hydrido compound 3.