Remote Epitaxy: Fundamentals, Challenges, and Opportunities

• Published in: Nano letters Vol. 24; no. 10; pp. 2939 - 2952
• Main Authors: Park, Bo-In, Kim, Jekyung, Lu, Kuangye, Zhang, Xinyuan, Lee, Sangho, Suh, Jun Min, Kim, Dong-Hwan, Kim, Hyunseok, Kim, Jeehwan
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 13.03.2024
• Subjects: remote epitaxy; freestanding membranes; heterogeneous integration; 2D materials
• ISSN: 1530-6984; 1530-6992
• DOI: 10.1021/acs.nanolett.3c04465

Advanced heterogeneous integration technologies are pivotal for next-generation electronics. Single-crystalline materials are one of the key building blocks for heterogeneous integration, although it is challenging to produce and integrate these materials. Remote epitaxy is recently introduced as a solution for growing single-crystalline thin films that can be exfoliated from host wafers and then transferred onto foreign platforms. This technology has quickly gained attention, as it can be applied to a wide variety of materials and can realize new functionalities and novel application platforms. Nevertheless, remote epitaxy is a delicate process, and thus, successful execution of remote epitaxy is often challenging. Here, we elucidate the mechanisms of remote epitaxy, summarize recent breakthroughs, and discuss the challenges and solutions in the remote epitaxy of various material systems. We also provide a vision for the future of remote epitaxy for studying fundamental materials science, as well as for functional applications.