Interfacial Interactions in van der Waals Heterostructures of MoS2 and Graphene
Interfacial coupling between neighboring layers of van der Waals heterostructures (vdWHs), formed by vertically stacking more than two types of two-dimensional materials (2DMs), greatly affects their physical properties and device performance. Although high-resolution cross-sectional scanning tunnel...
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Published in | ACS nano Vol. 11; no. 11; pp. 11714 - 11723 |
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Main Authors | , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
American Chemical Society
28.11.2017
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Subjects | |
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Abstract | Interfacial coupling between neighboring layers of van der Waals heterostructures (vdWHs), formed by vertically stacking more than two types of two-dimensional materials (2DMs), greatly affects their physical properties and device performance. Although high-resolution cross-sectional scanning tunneling electron microscopy can directly image the atomically sharp interfaces in the vdWHs, the interfacial coupling and lattice dynamics of vdWHs formed by two different types of 2DMs, such as semimetal and semiconductor, are not clear so far. Here, we report the ultralow-frequency Raman spectroscopy investigation on interfacial couplings in the vdWHs formed by graphene and MoS2 flakes. Because of the significant interfacial layer-breathing couplings between MoS2 and graphene flakes, a series of layer-breathing modes with frequencies dependent on their layer numbers are observed in the vdWHs, which can be described by the linear chain model. It is found that the interfacial layer-breathing force constant between MoS2 and graphene, α0 ⊥(I) = 60 × 1018 N/m3, is comparable with the layer-breathing force constant of multilayer MoS2 and graphene. The results suggest that the interfacial layer-breathing couplings in the vdWHs formed by MoS2 and graphene flakes are not sensitive to their stacking order and twist angle between the two constituents. Our results demonstrate that the interfacial interlayer coupling in vdWHs formed by two-dimensional semimetals and semiconductors can lead to new lattice vibration modes, which not only can be used to measure the interfacial interactions in vdWHs but also is beneficial to fundamentally understand the properties of vdWHs for further engineering the vdWHs-based electronic and photonic devices. |
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AbstractList | Interfacial coupling between neighboring layers of van der Waals heterostructures (vdWHs), formed by vertically stacking more than two types of two-dimensional materials (2DMs), greatly affects their physical properties and device performance. Although high-resolution cross-sectional scanning tunneling electron microscopy can directly image the atomically sharp interfaces in the vdWHs, the interfacial coupling and lattice dynamics of vdWHs formed by two different types of 2DMs, such as semimetal and semiconductor, are not clear so far. Here, we report the ultralow-frequency Raman spectroscopy investigation on interfacial couplings in the vdWHs formed by graphene and MoS2 flakes. Because of the significant interfacial layer-breathing couplings between MoS2 and graphene flakes, a series of layer-breathing modes with frequencies dependent on their layer numbers are observed in the vdWHs, which can be described by the linear chain model. It is found that the interfacial layer-breathing force constant between MoS2 and graphene, α0 ⊥(I) = 60 × 1018 N/m3, is comparable with the layer-breathing force constant of multilayer MoS2 and graphene. The results suggest that the interfacial layer-breathing couplings in the vdWHs formed by MoS2 and graphene flakes are not sensitive to their stacking order and twist angle between the two constituents. Our results demonstrate that the interfacial interlayer coupling in vdWHs formed by two-dimensional semimetals and semiconductors can lead to new lattice vibration modes, which not only can be used to measure the interfacial interactions in vdWHs but also is beneficial to fundamentally understand the properties of vdWHs for further engineering the vdWHs-based electronic and photonic devices. Interfacial coupling between neighboring layers of van der Waals heterostructures (vdWHs), formed by vertically stacking more than two types of two-dimensional materials (2DMs), greatly affects their physical properties and device performance. Although high-resolution cross-sectional scanning tunneling electron microscopy can directly image the atomically sharp interfaces in the vdWHs, the interfacial coupling and lattice dynamics of vdWHs formed by two different types of 2DMs, such as semimetal and semiconductor, are not clear so far. Here, we report the ultralow-frequency Raman spectroscopy investigation on interfacial couplings in the vdWHs formed by graphene and MoS2 flakes. Because of the significant interfacial layer-breathing couplings between MoS2 and graphene flakes, a series of layer-breathing modes with frequencies dependent on their layer numbers are observed in the vdWHs, which can be described by the linear chain model. It is found that the interfacial layer-breathing force constant between MoS2 and graphene, α0⊥(I) = 60 × 1018 N/m3, is comparable with the layer-breathing force constant of multilayer MoS2 and graphene. The results suggest that the interfacial layer-breathing couplings in the vdWHs formed by MoS2 and graphene flakes are not sensitive to their stacking order and twist angle between the two constituents. Our results demonstrate that the interfacial interlayer coupling in vdWHs formed by two-dimensional semimetals and semiconductors can lead to new lattice vibration modes, which not only can be used to measure the interfacial interactions in vdWHs but also is beneficial to fundamentally understand the properties of vdWHs for further engineering the vdWHs-based electronic and photonic devices. |
Author | Zhao, Yanyuan Tan, Ping-Heng Huang, Wei Lin, Miao-Ling Wu, Jiang-Bin Zhang, Hua Liu, Xue-Lu Xiong, Qihua Lu, Xin Li, Hai Ran, Feirong Zhang, Jun |
AuthorAffiliation | Key Laboratory for Organic Electronics and Information Displays & Institute of Advanced Materials (IAM), SICAM Division of Physics and Applied Physics, School of Physical and Mathematical Sciences State Key Laboratory of Superlattices and Microstructures Nanyang Technological University CAS Center of Excellence in Topological Quantum Computation Nanjing University of Posts & Telecommunications Shaanxi Institute of Flexible Electronics (SIFE) Northwestern Polytechnical University (NPU) University of Chinese Academy of Sciences Center for Programmable Materials, School of Materials Science and Engineering Nanjing Tech University NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering Key Laboratory of Flexible Electronics (KLOFE) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) |
AuthorAffiliation_xml | – name: State Key Laboratory of Superlattices and Microstructures – name: NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering – name: Northwestern Polytechnical University (NPU) – name: University of Chinese Academy of Sciences – name: Nanjing University of Posts & Telecommunications – name: Shaanxi Institute of Flexible Electronics (SIFE) – name: Center for Programmable Materials, School of Materials Science and Engineering – name: Key Laboratory of Flexible Electronics (KLOFE) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM) – name: Division of Physics and Applied Physics, School of Physical and Mathematical Sciences – name: Nanjing Tech University – name: CAS Center of Excellence in Topological Quantum Computation – name: Key Laboratory for Organic Electronics and Information Displays & Institute of Advanced Materials (IAM), SICAM – name: Nanyang Technological University |
Author_xml | – sequence: 1 givenname: Hai orcidid: 0000-0002-9659-1153 surname: Li fullname: Li, Hai organization: Nanyang Technological University – sequence: 2 givenname: Jiang-Bin surname: Wu fullname: Wu, Jiang-Bin organization: State Key Laboratory of Superlattices and Microstructures – sequence: 3 givenname: Feirong surname: Ran fullname: Ran, Feirong organization: Nanjing Tech University – sequence: 4 givenname: Miao-Ling surname: Lin fullname: Lin, Miao-Ling organization: State Key Laboratory of Superlattices and Microstructures – sequence: 5 givenname: Xue-Lu surname: Liu fullname: Liu, Xue-Lu organization: State Key Laboratory of Superlattices and Microstructures – sequence: 6 givenname: Yanyuan surname: Zhao fullname: Zhao, Yanyuan organization: Nanyang Technological University – sequence: 7 givenname: Xin surname: Lu fullname: Lu, Xin organization: Nanyang Technological University – sequence: 8 givenname: Qihua orcidid: 0000-0002-2555-4363 surname: Xiong fullname: Xiong, Qihua organization: Nanyang Technological University – sequence: 9 givenname: Jun orcidid: 0000-0002-9831-6796 surname: Zhang fullname: Zhang, Jun organization: University of Chinese Academy of Sciences – sequence: 10 givenname: Wei surname: Huang fullname: Huang, Wei organization: Northwestern Polytechnical University (NPU) – sequence: 11 givenname: Hua orcidid: 0000-0001-9518-740X surname: Zhang fullname: Zhang, Hua email: hzhang@ntu.edu.sg organization: Nanyang Technological University – sequence: 12 givenname: Ping-Heng orcidid: 0000-0001-6575-1516 surname: Tan fullname: Tan, Ping-Heng email: phtan@semi.ac.cn organization: University of Chinese Academy of Sciences |
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