Hydrogen Adsorption, Absorption, and Desorption at Palladium Nanofilms formed on Au(111) by Electrochemical Atomic Layer Deposition (E-ALD): Studies using Voltammetry and In Situ Scanning Tunneling Microscopy

Pd nanofilms were grown on Au(111) using the electrochemical form of atomic layer deposition (E-ALD). Deposits were formed by repeated cycles of surface-limited redox replacement (SLRR). Each cycle produced an atomic layer of Pd, allowing the reproducible formation of Pd nanofilms, with thicknesses...

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Published inJournal of physical chemistry. C Vol. 117; no. 30; pp. 15728 - 15740
Main Authors Sheridan, Leah B, Kim, Youn-Geun, Perdue, Brian R, Jagannathan, Kaushik, Stickney, John L, Robinson, David B
Format Journal Article
LanguageEnglish
Published Columbus, OH American Chemical Society 01.08.2013
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Abstract Pd nanofilms were grown on Au(111) using the electrochemical form of atomic layer deposition (E-ALD). Deposits were formed by repeated cycles of surface-limited redox replacement (SLRR). Each cycle produced an atomic layer of Pd, allowing the reproducible formation of Pd nanofilms, with thicknesses proportional to the number of cycles performed. Pd deposits were formed with up to 30 cycles, in the present study, and used as a platform for studies of hydrogen sorption/desorption as a function of thickness. The SLRR cycle involved the initial formation of an atomic layer of Cu by underpotential deposition, followed by its galvanic exchange with PdCl4 2– ions at open circuit. The first three cycles were studied using in situ electrochemical scanning tunneling microscopy (EC-STM), which showed a consistent morphology from cycle to cycle and the monatomic steps indicative of layer-by-layer growth. Cyclic voltammetry was used to study the hydrogen sorption/desorption properties as a function of thickness in 0.1 M H2SO4. The results indicated that the underlying Au structure greatly influenced hydrogen adsorption, as did film thickness for deposits formed with fewer than five cycles. No hydrogen absorption occurred for the thinnest films, although it increased linearly for thicker films, producing an average H/Pd molar ratio of 0.6. Electrochemical annealing was shown to improve surface order, producing CVs that strongly resembled those characteristic of bulk Pd(111).
AbstractList Pd nanofilms were grown on Au(111) using the electrochemical form of atomic layer deposition (E-ALD). Deposits were formed by repeated cycles of surface-limited redox replacement (SLRR). Each cycle produced an atomic layer of Pd, allowing the reproducible formation of Pd nanofilms, with thicknesses proportional to the number of cycles performed. Pd deposits were formed with up to 30 cycles, in the present study, and used as a platform for studies of hydrogen sorption/desorption as a function of thickness. The SLRR cycle involved the initial formation of an atomic layer of Cu by underpotential deposition, followed by its galvanic exchange with PdCl4 2– ions at open circuit. The first three cycles were studied using in situ electrochemical scanning tunneling microscopy (EC-STM), which showed a consistent morphology from cycle to cycle and the monatomic steps indicative of layer-by-layer growth. Cyclic voltammetry was used to study the hydrogen sorption/desorption properties as a function of thickness in 0.1 M H2SO4. The results indicated that the underlying Au structure greatly influenced hydrogen adsorption, as did film thickness for deposits formed with fewer than five cycles. No hydrogen absorption occurred for the thinnest films, although it increased linearly for thicker films, producing an average H/Pd molar ratio of 0.6. Electrochemical annealing was shown to improve surface order, producing CVs that strongly resembled those characteristic of bulk Pd(111).
Author Jagannathan, Kaushik
Kim, Youn-Geun
Perdue, Brian R
Stickney, John L
Robinson, David B
Sheridan, Leah B
AuthorAffiliation Sandia National Laboratories
University of Georgia
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Issue 30
Keywords Atomic layer method
Annealing
Nanolayers
Desorption
Palladium
Crystal growth from vapors
Layer thickness
Atomic layer epitaxial growth
Surface structure
Thin films
Sorption
Cyclic voltammetry
Layer by layer growth
Scanning tunneling microscopy
Adsorption
Morphology
Size effect
Electrodeposition
Microstructure
Language English
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Snippet Pd nanofilms were grown on Au(111) using the electrochemical form of atomic layer deposition (E-ALD). Deposits were formed by repeated cycles of...
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SubjectTerms Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Electrodeposition, electroplating
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Solid surfaces and solid-solid interfaces
Structure and morphology; thickness
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Vapor phase epitaxy; growth from vapor phase
Title Hydrogen Adsorption, Absorption, and Desorption at Palladium Nanofilms formed on Au(111) by Electrochemical Atomic Layer Deposition (E-ALD): Studies using Voltammetry and In Situ Scanning Tunneling Microscopy
URI http://dx.doi.org/10.1021/jp404723a
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