Photolysis of methoxy-substituted benzoin esters. Photosensitive protecting group for carboxylic acids

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Bibliographic Details
Published inJournal of the American Chemical Society Vol. 93; no. 26; pp. 7222 - 7228
Main Authors Sheehan, John C, Wilson, R. Marshall, Oxford, A. W
Format Journal Article
LanguageEnglish
Published American Chemical Society 01.12.1971
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Bibliography:istex:548D103EFDEF9B0224805880A568F8DD1197B3E2
ark:/67375/TPS-ZF53HGRF-K
ISSN:0002-7863
1520-5126
DOI:10.1021/ja00755a017