Wang, H., Li, M., Wang, H., Chai, Y., & Yuan, R. (2019). p–n-Sensitized Heterostructure Co3O4/Fullerene with Highly Efficient Photoelectrochemical Performance for Ultrasensitive DNA Detection. ACS applied materials & interfaces, 11(26), 23765-23772. https://doi.org/10.1021/acsami.9b05923
Chicago Style (17th ed.) CitationWang, Hai-Hua, Meng-Jie Li, Hai-Jun Wang, Ya-Qin Chai, and Ruo Yuan. "P–n-Sensitized Heterostructure Co3O4/Fullerene with Highly Efficient Photoelectrochemical Performance for Ultrasensitive DNA Detection." ACS Applied Materials & Interfaces 11, no. 26 (2019): 23765-23772. https://doi.org/10.1021/acsami.9b05923.
MLA (9th ed.) CitationWang, Hai-Hua, et al. "P–n-Sensitized Heterostructure Co3O4/Fullerene with Highly Efficient Photoelectrochemical Performance for Ultrasensitive DNA Detection." ACS Applied Materials & Interfaces, vol. 11, no. 26, 2019, pp. 23765-23772, https://doi.org/10.1021/acsami.9b05923.