Heteroepitaxial Growth of an Ultrathin β‑Ga2O3 Film on a Sapphire Substrate Using Mist CVD with Fluid Flow Modeling
β-Gallium oxide (Ga2O3) has received intensive attention in the scientific community as a significant high-power switching semiconductor material because of its remarkable intrinsic physical characteristics and growth stability. This work reports the heteroepitaxial growth of the β-Ga2O3 ultrathin f...
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Published in | ACS omega Vol. 7; no. 45; pp. 41236 - 41245 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
American Chemical Society
15.11.2022
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Online Access | Get full text |
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