Origin of Ferroelectricity in Epitaxial Si-Doped HfO2 Films

HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposit...

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Published inACS applied materials & interfaces Vol. 11; no. 4; pp. 4139 - 4144
Main Authors Li, Tao, Ye, Mao, Sun, Zhenzhong, Zhang, Nian, Zhang, Wei, Inguva, Saikumar, Xie, Chunxiao, Chen, Lang, Wang, Yu, Ke, Shanming, Huang, Haitao
Format Journal Article
LanguageEnglish
Published American Chemical Society 30.01.2019
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ISSN1944-8244
1944-8252
1944-8252
DOI10.1021/acsami.8b19558

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Abstract HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field E c and a remnant polarization P r of approximately 4–5 MV/cm and 8–32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting.
AbstractList HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field Ec and a remnant polarization Pr of approximately 4-5 MV/cm and 8-32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting.HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field Ec and a remnant polarization Pr of approximately 4-5 MV/cm and 8-32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting.
HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field E c and a remnant polarization P r of approximately 4–5 MV/cm and 8–32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting.
HfO₂-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO₂ films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO₂ films in different orientations of N-type SrTiO₃ substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field Ec and a remnant polarization Pᵣ of approximately 4–5 MV/cm and 8–32 μC/cm², respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO₂ films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca2₁ polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca2₁ ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting.
Author Inguva, Saikumar
Ke, Shanming
Li, Tao
Zhang, Nian
Ye, Mao
Wang, Yu
Zhang, Wei
Chen, Lang
Xie, Chunxiao
Huang, Haitao
Sun, Zhenzhong
AuthorAffiliation School of Materials Science and Engineering
The Hong Kong Polytechnic University
Department of Applied Physics and Materials Research Center
South University of Science and Technology of China
Dongguan University of Technology
School of Electrical Engineering & Intelligentization
College of Materials Science and Engineering
Shenzhen University
Shanghai Institute of Microsystem and Information Technology
School of Mechanical Engineering
Department of Physics
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N-type SrTiO3 substrates
PLD
epitaxial Si-doped HfO2 thin films
XRD
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ferroelectricity
HRTEM
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Snippet HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The...
HfO₂-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The...
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SubjectTerms crystal structure
industry
silicon
transmission electron microscopy
X-ray absorption spectroscopy
X-ray diffraction
Title Origin of Ferroelectricity in Epitaxial Si-Doped HfO2 Films
URI http://dx.doi.org/10.1021/acsami.8b19558
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