Origin of Ferroelectricity in Epitaxial Si-Doped HfO2 Films
HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposit...
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Published in | ACS applied materials & interfaces Vol. 11; no. 4; pp. 4139 - 4144 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
American Chemical Society
30.01.2019
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Subjects | |
Online Access | Get full text |
ISSN | 1944-8244 1944-8252 1944-8252 |
DOI | 10.1021/acsami.8b19558 |
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Abstract | HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field E c and a remnant polarization P r of approximately 4–5 MV/cm and 8–32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting. |
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AbstractList | HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field Ec and a remnant polarization Pr of approximately 4-5 MV/cm and 8-32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting.HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field Ec and a remnant polarization Pr of approximately 4-5 MV/cm and 8-32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting. HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO2 films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO2 films in different orientations of N-type SrTiO3 substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field E c and a remnant polarization P r of approximately 4–5 MV/cm and 8–32 μC/cm2, respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO2 films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca21 polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca21 ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting. HfO₂-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The growth of epitaxial Si-doped HfO₂ films has opened up a route to understand the mechanism of ferroelectricity. Here, we used pulsed laser deposition to grow epitaxial Si-doped HfO₂ films in different orientations of N-type SrTiO₃ substrates. Polar nanodomains can be written and read using piezoforce microscopy, and these domains are reversibly switched with a phase change of 180°. Films with different thicknesses displayed a coercive field Ec and a remnant polarization Pᵣ of approximately 4–5 MV/cm and 8–32 μC/cm², respectively. X-ray diffraction and high-resolution transmission electron microscopy (HRTEM) results identified that the as-grown Si-doped HfO₂ films have strained fluorite structures. The ABAB stacking mode of the Hf atomic grid observed by HRTEM clearly demonstrates that the ferroelectricity originates from the noncentrosymmetric Pca2₁ polar structure. Combined with soft X-ray absorption spectra, the results showed that the Pca2₁ ferroelectric crystal structure manifested as an O sublattice distortion by the effect of the interface strain and Si dopant interactions, resulting in a nanoscaled ferroelectric ordered state because of further crystal splitting. |
Author | Inguva, Saikumar Ke, Shanming Li, Tao Zhang, Nian Ye, Mao Wang, Yu Zhang, Wei Chen, Lang Xie, Chunxiao Huang, Haitao Sun, Zhenzhong |
AuthorAffiliation | School of Materials Science and Engineering The Hong Kong Polytechnic University Department of Applied Physics and Materials Research Center South University of Science and Technology of China Dongguan University of Technology School of Electrical Engineering & Intelligentization College of Materials Science and Engineering Shenzhen University Shanghai Institute of Microsystem and Information Technology School of Mechanical Engineering Department of Physics |
AuthorAffiliation_xml | – name: Shenzhen University – name: South University of Science and Technology of China – name: School of Mechanical Engineering – name: Shanghai Institute of Microsystem and Information Technology – name: College of Materials Science and Engineering – name: School of Materials Science and Engineering – name: Department of Physics – name: School of Electrical Engineering & Intelligentization – name: Department of Applied Physics and Materials Research Center – name: The Hong Kong Polytechnic University – name: Dongguan University of Technology |
Author_xml | – sequence: 1 givenname: Tao orcidid: 0000-0003-0104-3494 surname: Li fullname: Li, Tao organization: The Hong Kong Polytechnic University – sequence: 2 givenname: Mao surname: Ye fullname: Ye, Mao organization: South University of Science and Technology of China – sequence: 3 givenname: Zhenzhong surname: Sun fullname: Sun, Zhenzhong – sequence: 4 givenname: Nian surname: Zhang fullname: Zhang, Nian organization: Shanghai Institute of Microsystem and Information Technology – sequence: 5 givenname: Wei surname: Zhang fullname: Zhang, Wei – sequence: 6 givenname: Saikumar surname: Inguva fullname: Inguva, Saikumar organization: Shenzhen University – sequence: 7 givenname: Chunxiao surname: Xie fullname: Xie, Chunxiao – sequence: 8 givenname: Lang surname: Chen fullname: Chen, Lang organization: South University of Science and Technology of China – sequence: 9 givenname: Yu orcidid: 0000-0001-9160-3226 surname: Wang fullname: Wang, Yu organization: School of Materials Science and Engineering – sequence: 10 givenname: Shanming orcidid: 0000-0003-3204-1416 surname: Ke fullname: Ke, Shanming email: smke@szu.edu.cn organization: School of Materials Science and Engineering – sequence: 11 givenname: Haitao surname: Huang fullname: Huang, Haitao email: aphhuang@polyu.edu.hk organization: The Hong Kong Polytechnic University |
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Snippet | HfO2-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The... HfO₂-based unconventional ferroelectric materials were recently discovered and have attracted a great deal of attention in both academia and industry. The... |
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Title | Origin of Ferroelectricity in Epitaxial Si-Doped HfO2 Films |
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