Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO2

• Published in: Journal of physical chemistry. C Vol. 125; no. 46; pp. 25589 - 25599
• Main Authors: Kondati Natarajan, Suresh, Cano, Austin M, Partridge, Jonathan L, George, Steven M, Elliott, Simon D
• Format: Journal Article
• Language: English
• Published: American Chemical Society 25.11.2021
• Subjects: C: Chemical and Catalytic Reactivity at Interfaces

A combined computational and experimental study is employed to understand the competition between self-limiting (SL) and chemical vapor etch (CVE) reactions to design an atomic layer etch (ALE) process. The pulses in an ALE process have to be self-limiting; i.e., the reactions should reach saturatio...