by DING, Rui, CHAN, Vincent S, LI, Jiangang
Published in Plasma science & technology (01.10.2025)

by LIU, Haiqing, LI, Gongshun, YANG, Yao, ZHANG, Tao, LAN, Ting, LIAN, Hui, HONG, Bo, DING, Rui
Published in Plasma science & technology (01.10.2025)

by ZHANG, Jie, YE, Yang, TAN, Mingsheng, HUANG, Jia, CHEN, Jiale, ZHANG, Ling, XU, Guoliang, ZHANG, Yang, YANG, Lixiang, ZHAO, Zhihao, KONG, Defeng, DING, Rui, CHAN, Vincent, ZHONG, Fubin, QU, Chengming, WANG, Xiaopeng, ZHANG, Shoubiao, (庄革), Ge ZHUANG, Physics Design Team, CFEDR
Published in Plasma science & technology (01.10.2025)

by QIU, Zhiyong, HU, Youjun, SHEN, Wei, BAO, Jian, REN, Zhenzhen, ZHENG, Yifeng, SU, Pengjuan, XU, Yingfeng, WANG, Feng, CHEN, Jiale, LI, Guoqiang
Published in Plasma science & technology (01.10.2025)

by DING, Rui, LIU, Xiaoju, WANG, Hui, XU, Guoliang, JIA, Guozhang, WANG, Fuqiong, SI, Hang, SANG, Chaofeng, ZHANG, Chen, ZHAO, Xuele, CHAN, Vincent
Published in Plasma science & technology (01.10.2025)

by KUANG, Yuanyuan, WANG, Hanlin, GAO, Ming, XU, Chao, ZHANG, Haibiao, DAI, Yaopeng, TANG, Yunying, WANG, Xiaojie
Published in Plasma science & technology (01.10.2025)

by QIU, Zhiyong, CHEN, Liu, ZONCA, Fulvio, FALESSI, Matteo Valerio, FANG, Qian, WEI, Guangyu, CHEN, Ningfei
Published in Plasma science & technology (01.09.2025)

by MENG, Tianhang, HAN, Ao, HU, Yanlin, DING, Yongjie, NING, Zhongxi, WANG, Lei, YU, Daren, ZHOU, Zhongxiang
Published in Plasma science & technology (01.09.2025)

by XIAO, Chenyu, YU, Yi, WEN, Junru, KE, Rui, LIU, Hao, NIE, Lin, ZHOU, Yixuan, ZHAO, Guangyi, LAN, Tao, ZHOU, Haiyang, (徐皓), Hao XU, (袁子豪), Zihao YUAN, (王占辉), Zhanhui WANG, WANG, Huajie, XU, Min
Published in Plasma science & technology (01.09.2025)

by NAI, Shitong, HAN, Jianhai, ZHAO, Wenbao, XU, Shaofeng, SHI, Jianjun, GUO, Ying
Published in Plasma science & technology (01.09.2025)

by ZHANG, Peng, TANG, Mengyuan, CHEN, Huihui, SHA, Jiaqi
Published in Plasma science & technology (01.09.2025)

by REN, Yukang, WEN, Sheng, ZENG, Ming, WANG, Linwei, YU, Daren
Published in Plasma science & technology (01.09.2025)

by ZHANG, Mingjia, LIN, Taiyu, LIU, Guangchao, WU, Binhong, WANG, Xin, CHEN, Qiang
Published in Plasma science & technology (01.09.2025)

by SHEN, Haobo, LIU, Haiqing, LIAN, Hui, HAO, Yanbin, WANG, Shouxin, LI, Haoran, WAN, Minjie, KONG, Xiaofang, GU, Guohua
Published in Plasma science & technology (01.09.2025)

by SONG, Haoyu, ZHAO, Wenbao, NAI, Shitong, XU, Shaofeng, SHI, Jianjun, GUO, Ying
Published in Plasma science & technology (01.09.2025)

by YANG, Xin, LI, Yu, XU, Qian, DING, Fang, QI, Qiang, ZHANG, Zuchao, LEI, Mingzhun, ZHENG, Jinxing, LUO, Guangnan, LU, Kun, ZHOU, Haishan
Published in Plasma science & technology (01.09.2025)

by LIU, Xiangmei, (王博), Bo WANG, LYU, Mingyu, ZHAO, Shuxia, LI, Hongying
Published in Plasma science & technology (01.09.2025)

by SHI, Yuejiang, SONG, Xianming, (郭栋), Dong GUO, (姜欣辰), Xinchen JIANG, (刘勇), Yong LIU, (顾翔), Xiang GU, (刘成岳), Chengyue LIU, (李佳), Jia LI, (宋绍栋), Shaodong SONG, (王嵎民), Yumin WANG, (李松建), Songjian LI, (陶仁义), Renyi TAO, (韩坤), Kun HAN, (董力立), Lili DONG, (张聪), Cong ZHANG, (李玉进), Yujin LI, (孙恬恬), Tiantian SUN, (高凡), Fan GAO, (赵毅航), Yihang ZHAO, (张宇鹏), Yupeng ZHANG, (武全), Quan WU, (于岩), Yan YU, (李磊), Lei LI, (杨光), Guang YANG, (黄贤礼), Xianli HUANG, (何宏达), Hongda HE, (李栋), Dong LI, (谢华生), Huasheng XIE, (刘兵), Bing LIU, (赵寒月), Hanyue ZHAO, (杨恩武), Enwu YANG, (杨圆明), Yuanming YANG, (王宇), Yu WANG, (韩磊), Lei HAN, (邢博), Bo XING, (王振兴), Zhenxing WANG, (周培海), Peihai ZHOU, (罗文武), Wenwu LUO, (吴超), Chao WU, (赵鑫), Xin ZHAO, (边晨), Chen BIAN, (吴堃), Kun WU, (梁云峰), Yunfeng LIANG, (董家齐), Jiaqi DONG, (袁保山), Baoshan YUAN, PENG, Y-K Martin, (刘敏胜), Minsheng LIU, Team, the EXL-50U
Published in Plasma science & technology (01.09.2025)

by FU, Yanbiao, LIN, Canjiong, SUN, Duixiong, HAN, Weiwei, CHANG, Jiawei, MA, Xinrong, SU, Maogen
Published in Plasma science & technology (01.09.2025)

by ZHU, Xiang, LIN, Xiaodong, WU, Muquan, LI, Hang, LI, Jingchun, HAO, Baolong, LIU, Ying, GAO, Xiang, LI, Jiangang, GENTLE, Kenneth W.
Published in Plasma science & technology (01.09.2025)