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GOWRI KAMARTHY » GOWRI KAMARTHI
The influence of post-etch InGaAs fin profile on electrical performance
Ivanov, Tsvetan, Pourghaderi, Mohammad Ali, Lin, Dennis, Yu, Jen-Kan, Tan, Samantha, Kimura, Yoshie, Hellin, David, Geypen, Jeffrey, Bender, Hugo, Vertommen, Johan, Kamarthy, Gowri, Collaert, Nadine, Marks, Jef, Vahedi, Vahid, Arghavani, Reza, Thean, Aaron
Published in Japanese Journal of Applied Physics (01.04.2014)
Published in Japanese Journal of Applied Physics (01.04.2014)
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Journal Article
Progress report on high aspect ratio patterning for memory devices
Shen, Meihua, Lill, Thorsten, Hoang, John, Chi, Hao, Routzahn, Aaron, Church, Jonathan, Subramonium, Pramod, Puthenkovilakam, Ragesh, Reddy, Sirish, Bhadauriya, Sonal, Roberts, Sloan, Kamarthy, Gowri
Published in Japanese Journal of Applied Physics (01.07.2023)
Published in Japanese Journal of Applied Physics (01.07.2023)
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Journal Article
Enabling High Aspect Ratio 3D NAND Scaling through Deposition and Etch Co-Optimization (DECO)
Shen, Meihua, Hoang, John, Chi, Hao, Routzahn, Aaron, Church, Jonathan, Subramonium, Pramod Subramonium, Puthenkovilakam, Ragesh, Reddy, Sirish Reddy, Bhadauriya, Sonal, Roberts, Sloan, Lill, Thorsten, Kamarthy, Gowri
Published in Meeting abstracts (Electrochemical Society) (09.10.2022)
Published in Meeting abstracts (Electrochemical Society) (09.10.2022)
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Journal Article
HIGH ASPECT RATIO CARBON ETCH WITH SIMULATED BOSCH PROCESS
KAMARTHY, Gowri Channa, SUBRAMANIAN, Priyadarsini, SU, Xiaofeng, LI, Jing, TAN, Zhongkui
Year of Publication 25.01.2024
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Year of Publication 25.01.2024
Patent
ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
LI, Weiyi, KAMARTHY, Gowri Channa, YUN, Seokmin, HUANG, Shuogang, WAN, Zhimin
Year of Publication 31.03.2022
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Year of Publication 31.03.2022
Patent
IN SITU DECLOGGING IN PLASMA ETCHING
KAWAGUCHI, Mark Naoshi, ZHU, Ji, KAMARTHY, Gowri Channa, LIU, Wenchi, SUBRAMANIAN, Priyadarsini, MA, Qiang, SU, Xiaofeng, TAN, Zhongkui
Year of Publication 14.12.2023
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Year of Publication 14.12.2023
Patent
IN SITU DECLOGGING IN PLASMA ETCHING
KAWAGUCHI, Mark Naoshi, ZHU, Ji, KAMARTHY, Gowri Channa, LIU, Wenchi, SUBRAMANIAN, Priyadarsini, MA, Qiang, SU, Xiaofeng, TAN, Zhongkui
Year of Publication 27.04.2023
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Year of Publication 27.04.2023
Patent
Film stack simplification for high aspect ratio patterning and vertical scaling
Yang, Jialing, Chi, Hao, van Schravendijk, Bart J, Kawaguchi, Mark Naoshi, Musselwhite, Nathan, Uglow, Jay E, Altieri, Nicholas Dominic, Shankar, Nagraj, Shen, Meihua, Banerji, Ananda K, Kamarthy, Gowri Channa, Wu, Hui-Jung, Lill, Thorsten Bernd, Hoang, John, Routzahn, Aaron Lynn, Gunawan, Gereng, McLaughlin, Kevin M
Year of Publication 03.09.2024
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Year of Publication 03.09.2024
Patent
ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
LI, Weiyi, KAMARTHY, Gowri Channa, YUN, Seokmin, HUANG, Shuogang, WAN, Zhimin
Year of Publication 06.08.2020
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Year of Publication 06.08.2020
Patent
Internal plasma grid for semiconductor fabrication
Lill, Thorsten, Titus, Monica, Singh, Harmeet, Vahedi, Vahid, Kamarthy, Gowri, Paterson, Alex
Year of Publication 05.03.2019
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Year of Publication 05.03.2019
Patent
커패시터-활성 실리콘 전기적 커플링을 제공하기 위한 메모리 층들의 선택적인 에칭 및 증착
DOAN SAMANTHA, SRIVASTAVA RATNDEEP, GAO HUI, KAMARTHY GOWRI CHANNA, UPADHYAYA GANESH
Year of Publication 22.11.2023
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Year of Publication 22.11.2023
Patent
High aspect ratio carbon etch with simulated BOSCH process
TAN, ZHONG-KUI, KAMARTHY, GOWRI CHANNA, SUBRAMANIAN, PRIYADARSINI, SU, XIAO-FENG, LI, JING
Year of Publication 16.05.2024
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Year of Publication 16.05.2024
Patent
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERTICAL SCALING
Yang, Jialing, Chi, Hao, van Schravendijk, Bart J, Kawaguchi, Mark Naoshi, Musselwhite, Nathan, Uglow, Jay E, Altieri, Nicholas Dominic, Shankar, Nagraj, Shen, Meihua, Banerji, Ananda K, Kamarthy, Gowri Channa, Wu, Hui-Jung, Lill, Thorsten Bernd, Hoang, John, Routzahn, Aaron Lynn, Gunawan, Gereng, McLaughlin, Kevin M
Year of Publication 17.02.2022
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Year of Publication 17.02.2022
Patent