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One Step Toward a New Generation of C‑MOS Compatible Oxide P–N Junctions: Structure of the LSMO/ZnO Interface Elucidated by an Experimental and Theoretical Synergic Work
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METHOD FOR MEASURING AT LEAST ONE TARGET ON A SUBSTRATE
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Method of determining a value of a parameter of interest of a patterning process, device manufacturing method
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Year of Publication 23.11.2021
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METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD
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Year of Publication 30.04.2020
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Substrate, patterning device for obtaining said substrate, and methods for measureing focus parameters on said substrate
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Year of Publication 11.08.2024
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A substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
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Year of Publication 16.10.2023
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METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTERNING PROCESS, DEVICE MANUFACTURING METHOD
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Year of Publication 21.11.2022
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Year of Publication 21.11.2022
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Method of determining a value of a parameter of interest of a patterning process, device manufacturing method
WARNAAR, PATRICK, SMILDE, HENDRIK JAN HIDDE, HAJIAHMADI, MOHAMMADREZA, MACHT, LUKASZ JERZY, SOKOLOV, SERGEI, VAN DEN BOS, KAREL HENDRIK WOUTER, KUNNEMAN, LUCAS TIJN, BOS, HILKO DIRK
Year of Publication 01.07.2020
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Year of Publication 01.07.2020
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