Negative-bias temperature instability cure by process optimization
Scarpa, A., Ward, D., Dubois, J., van Marwijk, L., Gausepohl, S., Campos, R., Kwang Ye Sim, Cacciato, A., Kho, R., Bolt, M.
Published in IEEE transactions on electron devices (01.06.2006)
Published in IEEE transactions on electron devices (01.06.2006)
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Journal Article
Reduction of bitline to control gate leakage for improved embedded 0.18 μm FLASH yield and reliability
CACCIATO, A, NELSON, S, DIEKEMA, M, HENDRIKS, M, VAN MARWIJK, L, DEUPER, C, GERRITSEN, E, VERHAAR, R, DORMANS, D
Year of Publication 2002
Year of Publication 2002
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Conference Proceeding
Effect of the process flow on negative-bias-temperature-instability
Scarpa, A., van Marwijk, L., Cacciato, A., Ballarin, F.
Published in 2003 8th International Symposium Plasma- and Process-Induced Damage (2003)
Published in 2003 8th International Symposium Plasma- and Process-Induced Damage (2003)
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Conference Proceeding
Yield and reliability effects of interlevel dielectric plasma enhanced deposition induced charging damage
Scarpa, A., Van Marwijk, L., Peters, W., Boter, D., Kuper, F.G.
Published in 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) (2001)
Published in 2001 6th International Symposium on Plasma- and Process-Induced Damage (IEEE Cat. No.01TH8538) (2001)
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Conference Proceeding
Fast wafer level monitoring of stress induced leakage current in deep sub-micron embedded non-volatile memory processes
Guoqiao Tao, Scarpa, A., Valk, H., van Marwijk, L., van Dijk, K., Kuper, F.
Published in IEEE International Integrated Reliability Workshop Final Report, 2002 (2002)
Published in IEEE International Integrated Reliability Workshop Final Report, 2002 (2002)
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Conference Proceeding
The effect of fluorine implant on NBTI behaviour in BCD-processes
Olthof, E., Combrie, M., van Marwijk, L., Claes, J., Dubois, J., Thillaigovindan, J., Jianhua Sun, Ng, W.
Published in 2011 IEEE International Integrated Reliability Workshop Final Report (01.10.2011)
Published in 2011 IEEE International Integrated Reliability Workshop Final Report (01.10.2011)
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Conference Proceeding
Device architecture and reliability aspects of a novel 1.22 μm2 EEPROM cell in 0.18 μm node for embedded applications
TAO, G, SCARPA, A, VAN DIJK, K, VAN MARWIJK, L, DORMANS, D, GARBE, J, BOTER, D, VERHAAR, R
Published in Microelectronic engineering (01.04.2004)
Published in Microelectronic engineering (01.04.2004)
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Conference Proceeding
Journal Article
Device architecture and reliability aspects of a novel 1.22 mum2 EEPROM cell in 0.18 mum node for embedded applications
Tao, G, Scarpa, A, van Dijk, K, van Marwijk, L, Dormans, D, Garbe, J, Boter, D, Verhaar, R
Published in Microelectronic engineering (01.04.2004)
Published in Microelectronic engineering (01.04.2004)
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Journal Article
Applying the fWLR concept to Stress induced leakage current in non-volatile memory processes
Tao, Guoqiao, Scarpa, Andrea, van Marwijk, Leo, van Dijk, Kitty, Kuper, Fred
Published in Microelectronics and reliability (01.08.2004)
Published in Microelectronics and reliability (01.08.2004)
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Journal Article
Reduction of Bitline to Control Gate Leakage for Improved Embedded 0.18 um FLASH Yield and Reliability
Cacciato, A., Nelson, S., Diekema, M., Hendriks, M., van Marwijk, L., Deuper, C., Gerritsen, E., Verhaar, R., Dormans, D.
Published in 32nd European Solid-State Device Research Conference (2002)
Published in 32nd European Solid-State Device Research Conference (2002)
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Conference Proceeding