A high-power, low-contamination laser plasma source for Extreme UV lithography
Bijkerk, F., Shmaenok, L.A., Shevelko, A.P., Bastiaensen, R.K.F.J., Bruineman, C., van Honk, A.G.J.R.
Published in Microelectronic engineering (01.02.1995)
Published in Microelectronic engineering (01.02.1995)
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Journal Article
Conference Proceeding
Issues of laser plasma sources for soft x-ray projection lithography
Shmaenok, L., Bijkerk, F., Louis, E., van Honk, A., van der Wiel, M.J., Platonov, Yu, Shevelko, A., Mitrofanov, A., Frowein, H., Nicolaus, B., Voβ, F., Désor, R.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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Journal Article