Search Results - "process layer" :: K.UTB vyhledávací portál

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SUBSTRATE PROVIDED WITH AN ALIGNMENT MARK IN A SUBSTANTIALLY TRANSMISSIVE PROCESS LAYER, MASK FOR EXPOSING SAID MARK, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 19.03.2009

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 09.12.2008

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SUBSTRATE PROVIDED WITH LINEUP MARK IN SUBSTANTIALLY TRANSPARENT PROCESS LAYER, MASK FOR EXPOSING MARK, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED THEREBY

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 01.03.2007

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN RICHARD JOHANNES F
Year of Publication 29.06.2006

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 06.06.2006

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 24.02.2005

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 22.02.2005

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN, RICHARD JOHANNES FRANCISCUS
Year of Publication 11.06.2003

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SUBSTRATE PROVIDED WITH ALIGNMENT MARK IN SUBSTANTIALLY TRANSMISSIVE PROCESS LAYER, MASK FOR EXPOSING THE MARK, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 28.03.2003

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Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby

by VAN HAREN RICHARD JOHANNES FRANCISCUS
Year of Publication 05.12.2002

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Substrate provided with an Alignment Mark in a Substantially Transmissive Process Layer, Mask for Exposing said Mark, Device Manufacturing Method, and Device Manufactured Thereby

Year of Publication 25.05.2006

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Layers and mechanisms: A new taxonomy for the Bullwhip Effect

by Miragliotta, Giovanni
Published in International journal of production economics (01.12.2006)

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Journal Article

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Evaluation of the importance of additive manufacturing technology in terms of sustainable production with the DEMATEL method

by Ozguner, Mert, Ozguner, Zeynep
Published in International journal of advanced and applied sciences (01.10.2022)

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S-BPM in the Wild: Practical Value Creation

by Fleischmann, Albert, Schmidt, Werner, Stary, Christian
Year of Publication 2015

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eBook

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Method of selectively processing wafer edge regions to increase wafer uniformity, and system for accomplishing same

by PASADYN ALEXANDER J, BODE CHRISTOPHER A
Year of Publication 08.07.2003

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基于GOOSE信息的微电网运行模式控制装置

Year of Publication 09.11.2018

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Microgrid operation mode control device based on GOOSE information

by MA HONGWEI, FU MEIPING, ZHOU FENGQUAN, ZHANG XINCHANG, ZHANG XIANG'AN, LI RUISHENG
Year of Publication 20.08.2014

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DIELECTRIC FILM STRUCTURE AND METHOD OF PREPARING THE SAME

by SHIN, DONG JOO, PARK, MOON SOO, KIM, SUNG HYUN, LEE, CHOON KEUN, LIM, SUNG TAEK
Year of Publication 23.08.2012

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Gold hydrometallurgy full-flow layer and block operation status on-line evaluation method

by LIU YAN, WANG FULI, CUI HAONAN
Year of Publication 15.05.2018

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System for completing sequential control by intelligent one-key operation

by LI HAIXING, WANG RUI, WANG ZHENGTAO, LI RUISHENG, TANG YUNLONG
Year of Publication 22.06.2011

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Patent

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