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Geometric variation: A novel approach to examine the surface roughness and the line roughness effects in trigate FinFETs
Hsieh, E. R., Fan, Y. C., Liu, C. H., Chung, Steve S., Huang, R. M., Tsai, C. T., Yew, T. R.
Published in 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) (01.02.2017)
Published in 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) (01.02.2017)
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