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PROCESS FOR IMPROVING THE THICKNESS UNIFORMITY OF A THIN OXIDE LAYER IN SEMICONDUCTOR WAFER FABRICATION
by
TEWS, HELMUT HORST
,
SCHREMS, MARTIN
Year of Publication
12.06.2002
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Process for improving the thickness uniformity of a thin layer in semiconductor wafer fabrication
by
SCHREMS MARTIN
,
TEWS HELMUT HORST
Year of Publication
22.05.2001
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PROCESS FOR IMPROVING THE THICKNESS UNIFORMITY OF A THIN OXIDE LAYER IN SEMICONDUCTOR WAFER FABRICATION
by
TEWS, HELMUT HORST
,
SCHREMS, MARTIN
Year of Publication
22.03.2001
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Patent
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general tagging of cross-sectional technologies spanning over several sections of the ipc
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general tagging of new technological developments
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technical subjects covered by former uspc cross-reference art collections [xracs] and digests
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