Search Results - "electron beam lithography" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

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Electron beam lithography system and method

by NAKAYAMA; YOSHINORI, SUGA; OSAMU, WAKABAYASHI; HIROAKI, OKAZAKI; SHINJI
Year of Publication 17.03.1992

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Patent

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METHOD FOR CORRECTING VARIATIONS IN LINE WIDTH AT ELECTRON BEAM LITHOGRAPHY FOR EXPOSURE, AND RECORD MEDIUM FOR RECORDING THE METHOD

by KI GENDAI
Year of Publication 14.02.2003

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Patent

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Exposure method for correcting dimension variation in electron beam lithography, and recording medium for recording the same

by KI WON-TAI
Year of Publication 06.02.2003

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Patent

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METHOD AND DEVICE FOR ELECTRON BEAM LITHOGRAPHY

by KONO TOSHIHIKO
Year of Publication 14.09.1990

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Patent

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CHEMICAL AMPLIFICATION RESIST SUITABLE FOR ELECTRON BEAM LITHOGRAPHY AND CHEMICAL AMPLIFICATION RESIST SYSTEM

by HUANG WU-SONG, LEE KIM Y, PETRILLO KAREN E, BUCCHIGNANO JAMES J, MOREAU WAYNE M, KATNANI AHMAD D
Year of Publication 15.10.1999

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Patent

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Method for imaging by means of electron-beam lithography

by EISENMANN, HANS, 81677 MUENCHEN, DE
Year of Publication 09.02.1995

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Patent

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Photoactive compound, preparation thereof and use thereof in resist for x-ray or electron beam lithography

by AVIRAM, ARI, CONLEY, WILLARD EARL, JR, SEEGER, DAVID EARLE, BUCCA, DANIEL, BRUNSVOLD, WILLIAM ROSS
Year of Publication 03.04.1996

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Patent

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Electron beam lithography to print more powerful chips

Published in The gazette (Colorado Springs, Colo.) (25.07.1996)

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Newspaper Article

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Method of compensating for proximity effects in electron-beam lithography

by GREENEICH; JAMES S
Year of Publication 28.04.1981

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Patent

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Method of generating data for the production of a structure defined by design data, e.g. for electron beam lithography, overcomes some disadvantages with respect to increase in layout complexity and data quantity to be processed

by WAAS, THOMAS, HARTMANN, HANS
Year of Publication 28.10.1999

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Patent

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METHOD OF REGULATING SEMICONDUCTOR SUBSTRATE IN ELECTRON BEAM LITHOGRAPHY AND REGULATING MARK

by HANSU FURIIDORITSUHI
Year of Publication 29.11.1976

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Patent

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Lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system

by GUARINO; NICHOLAS
Year of Publication 14.07.1981

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Patent

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Electron source having carbon nanotube and electron microscope as well as electron beam lithography device using the same

by NUMATA, YOSHIMICHI, FUJIEDA, TADASHI, HAYASHIBARA, MITSUO, HIDAKA, KISHIFU, SUZUKI, SHUICHI
Year of Publication 01.08.2004

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Patent

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ELECTRON SOURCE HAVING CARBON NANOTUBE AND ELECTRON MICROSCOPE AS WELL AS ELECTRON BEAM LITHOGRAPHY DEVICE USING THE SAME

by HORIUCHI TOSHIAKI, SUZUKI SHUICHI, NUMATA YOSHIMICHI, HIDAKA KISHIO, HAYASHIBARA MITSUO, FUJIEDA TADASHI
Year of Publication 18.02.2004

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Patent

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Chapter 12 - Development of Optical Sensors Using Graphene

by Lai, King Wai Chiu, Xi, Ning, Fung, Carmen Kar Man, Chen, Hongzhi
Published in Nano Optoelectronic Sensors and Devices (2012)

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Book Chapter

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Development of Optical Sensors Using Graphene

by Xi, Ning, Lai, King
Published in Nano Optoelectronic Sensors and Devices (2012)

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Book Chapter

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Multi-Beam Concepts for Nanometer Devices

by Lischke, B., Bennecke, W., Brunner, M., Herrmann, K. H., Heuberger, A., Knapek, E., Schäffer, P., Schnakenberg, U.
Published in Japanese Journal of Applied Physics (01.10.1989)

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Journal Article

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Microscopy and Microanalysis: Principles of Electron Optics, Volumes 1 & 2, Basic Geometrical Optics and Applied Geometrical Optics, Second Edition

by Spence, JCH
Published in Microscopy and microanalysis (01.02.2019)

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Book Review

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Memory efficient constrained optimization of scanning-beam lithography

by Jidling, Carl, Fleming, Andrew J., Wills, Adrian G., Schön, Thomas B.
Published in Optics express (06.06.2022)

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Journal Article

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Proton-Gated Synaptic Transistors, Based on an Electron-Beam Patterned Nafion Electrolyte

by Mohanty, Himadri Nandan, Tsuruoka, Tohru, Mohanty, Jyoti Ranjan, Terabe, Kazuya
Published in ACS applied materials & interfaces (19.04.2023)

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Journal Article

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