Spacer lithography for 3D MOS devices using amorphous silicon deposited by ECR-CVD
Rosa, Andressa M., Diniz, Jose A., Doi, Ioshiaki, Canesqui, Mara A., dos Santos, Marcos V. P., Vaz, Alfredo R.
Published in 2015 30th Symposium on Microelectronics Technology and Devices (SBMicro) (01.08.2015)
Published in 2015 30th Symposium on Microelectronics Technology and Devices (SBMicro) (01.08.2015)
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