A New Etch Planarization Technology to Correct Non-Uniformity Post Chemical Mechanical Polishing
Meihua Shen, Baosuo Zhou, Yifeng Zhou, Hoang, John, Bowers, Jim, Bailey, Andrew D., Pape, Eric, Singh, Harmeet, Wise, Rich, Dasaka, Ravi K.
Published in IEEE transactions on semiconductor manufacturing (01.11.2015)
Published in IEEE transactions on semiconductor manufacturing (01.11.2015)
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Journal Article
Etch planarization - A new approach to correct non-uniformity post chemical mechanical polishing
Meihua Shen, Baosuo Zhou, Yifeng Zhou, Hoang, John, Bowers, Jim, Bailey, Andrew, Pape, Eric, Singh, Harmeet, Dasaka, Ravi K., Wise, Rich
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
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Conference Proceeding
NOVEL METHOD TO ETCH COPPER BARRIER FILM
HUANG SHUOGANG, MEIHUA SHEN, JOHN HOANG, ZHOU BAOSUO, PRITHU SHARMA, THORSTEN LILL, ZHU JI
Year of Publication 09.06.2016
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Year of Publication 09.06.2016
Patent
NOVEL METHOD TO ETCH COPPER BARRIER FILM
HUANG SHUOGANG, HOANG JOHN, ZHOU BAOSUO, LILL THORSTEN, SHEN MEIHUA, ZHU JI, SHARMA PRITHU
Year of Publication 19.04.2016
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Year of Publication 19.04.2016
Patent
METHOD OF PLANARIZING AN UPPER SURFACE OF A SEMICONDUCTOR SUBSTRATE IN A PLASMA ETCH CHAMBER
KIMURA YOSHIE, KAMARTHY GOWRI, HOANG JOHN, ZHOU BAOSUO, ZHOU YIFENG, SINGH HARMEET, TITUS MONICA, SHEN MEIHUA
Year of Publication 07.09.2015
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Year of Publication 07.09.2015
Patent
PITCH REDUCTION TECHNOLOGY USING ALTERNATING SPACER DEPOSITIONS DURING THE FORMATION OF A SEMICONDUCTOR DEVICE AND SYSTEMS INCLUDING SAME
NIROOMAND ARDAVAN, MENG SHUANG, GREELEY JOSEPH N, ZHOU BAOSUO, ABATCHEV MIRZAFER K, MORGAN PAUL A, COPPA BRIAN J
Year of Publication 21.08.2012
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Year of Publication 21.08.2012
Patent
Block-to-block isolation and deep contact using pillars in a memory array
Gowda, Srivardhan, Parat, Krishna, Cleereman, Brian J, Thimmegowda, Deepak, Liu, Liu, Sel, Jong Sun, Lin, Jui-Yen, Zhou, Baosuo
Year of Publication 15.10.2024
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Year of Publication 15.10.2024
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Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same
Niroomand, Ardavan, Morgan, Paul A, Meng, Shuang, Greeley, Joseph Neil, Zhou, Baosuo, Coppa, Brian J, Abatchev, Mirzafer K
Year of Publication 04.07.2024
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Year of Publication 04.07.2024
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Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
Niroomand, Ardavan, Morgan, Paul A, Meng, Shuang, Greeley, Joseph Neil, Zhou, Baosuo, Coppa, Brian J, Abatchev, Mirzafer K
Year of Publication 19.03.2024
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Year of Publication 19.03.2024
Patent
BLOCK-TO-BLOCK ISOLATION AND DEEP CONTACT USING PILLARS IN MEMORY ARRAY
LIU, Liu, SEL, Jong Sun, THIMMEGOWDA, Deepak, GOWDA, Srivardhan, CLEEREMAN, Brian J, PARAT, Krishna, LIN, Jui-Yen, ZHOU, Baosuo
Year of Publication 11.10.2023
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Year of Publication 11.10.2023
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3D NAND COMINGLED WORDLINE CONTACT AND THROUGH ARRAY VIA AREA
TAKAHASHI, Yuji, LIU, Liu, LIU, Zengtao, NISHAT, Md Resaul Karim, THIMMEGOWDA, Deepak, EASON, Kwame Nkrumah, KOH, Hoon, MAYS, Ebony, ZHOU, Baosuo
Year of Publication 02.05.2024
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Year of Publication 02.05.2024
Patent
Cobalt etch back
Shen, Meihua, Lill, Thorsten, Yang, Jialing, Hoang, John, Zhou, Baosuo
Year of Publication 22.09.2020
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Year of Publication 22.09.2020
Patent