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PITCH REDUCTION TECHNOLOGY USING ALTERNATING SPACER DEPOSITIONS DURING THE FORMATION OF A SEMICONDUCTOR DEVICE AND SYSTEMS INCLUDING SAME
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PITCH REDUCTION TECHNOLOGY USING ALTERNATING SPACER DEPOSITIONS DURING THE FORMATION OF A SEMICONDUCTOR DEVICE AND SYSTEMS INCLUDING SAME
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Year of Publication 24.09.2014
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Year of Publication 01.11.2011
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Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
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Year of Publication 16.04.2008
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