Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
EDER-KAPL, Stefan, LOESCHNER, Hans, ZEININGER, Michalea, FALLMANN, Wolfgang, KIRCH, Oliver, PATSIS, George P, CONSTANTOUDIS, V, GOGOLIDES, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Conference Proceeding
Journal Article
Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
Eder-Kapl, Stefan, Loeschner, Hans, Zeininger, Michalea, Fallmann, Wolfgang, Kirch, Oliver, Patsis, George P., Constantoudis, V., Gogolides, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
Get full text
Journal Article