Design and operating characteristics of a metalorganic vapor phase epitaxy production scale, vertical, high speed, rotating disk reactor
Tompa, G.S., Zawadzki, P.A., Moy, K., McKee, M., Thompson, A.G., Gurary, A.I., Wolak, E., Esherick, P., Breiland, W.G., Evans, G.H., Bulitka, N., Hennessy, J., Moore, C.J.L.
Published in Journal of crystal growth (01.12.1994)
Published in Journal of crystal growth (01.12.1994)
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Journal Article
Conference Proceeding
A parametric investigation of GaAs epitaxial growth uniformity in a high speed, rotating-disk MOCVD reactor
Tompa, G.S., McKee, M.A., Beckham, C., Zawadzki, P.A., Colabella, J.M., Reinert, P.D., Capuder, K., Stall, R.A., Norris, P.E.
Published in Journal of crystal growth (1988)
Published in Journal of crystal growth (1988)
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Journal Article
Thermal and flow issues in the design of metalorganic chemical vapor deposition reactors
Gurary, A.I., Tompa, G.S., Thompson, A.G., Stall, R.A., Zawadzki, P.A., Schumaker, N.E.
Published in Journal of crystal growth (01.12.1994)
Published in Journal of crystal growth (01.12.1994)
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Journal Article
Conference Proceeding
GaAs/AlGaAs atomic layer epitaxy in a commercial MOCVD reactor
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Journal Article
Conference Proceeding
Large area, production MOCVD rotating disk reactor development and characteristics
Tompa, G.S., Breiland, W.G., Gurary, A., Zawadzki, P.A., Evans, G.H., Esherick, P., Kroll, B., Stall, R.A.
Published in Microelectronics (01.11.1994)
Published in Microelectronics (01.11.1994)
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Journal Article
Design and applications of large area RDRs
Tompa, G.S., Kroll, W.J., Chern, C., Liu, H., Zawadzki, P.A., Gurary, A., Thompson, A., McKee, M., Stall, R.A.
Published in III-Vs review (1994)
Published in III-Vs review (1994)
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Magazine Article