by CHEN, Zhipeng, ZHU, Lizhi, XU, Xin, ZHENG, Wei, ZHANG, Ming, GAO, Li, XIA, Minghui, YANG, Jie, ZHU, Mingchong, HAO, Zhigang, JIAO, Shaodong, CHENG, Zhifeng, YANG, Zhoujun, ZHANG, Xiaoqing, CHEN, Zhongyong, WANG, Nengchao, DING, Yonghua, ZHUANG, Ge, GENTLE, Kenneth W, LIANG, Yunfeng, PAN, Yuan
Published in Plasma science & technology (01.12.2022)